Paper Abstract and Keywords |
Presentation |
2013-10-22 16:05
Electron ray tracing from Field Emitter Array incorporated with electrostatic lens Hidekazu Murata, Hiroshi Shimoyama (Meijo Univ.), Yoichiro Neo, Hidenori Mimura (Shizuoka Univ.), Tomoya Yoshida, Masayoshi Nagao (AIST) |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Field emitter arrays (FEAs) incorporated with electrostatic lens are regarded as strong candidates for multi field emission sources for a multi-column, multi-beam direct write electron beam lithography system, because a high throughput, high resolution electron beam lithography system is strongly required as a substitute for a light optical lithography system in the next generation. So far, we have performed the analysis of the FEAs incorporated with electrostatic lens by means of direct ray tracing of electrons emitted from emitter surface. In the present study, a paraxial trajectory method has been used more systematically and quantitatively to evaluate the optical properties of the lens such as spherical and chromatic aberration coefficients. As a result, we have found that the paraxial trajectory method can be utilized for even FEAs having a fine structure with sufficient accuracy. From the obtained aberration coefficients, the electron optical brightness of the FEAs has been calculated and compared among three types of focusing electrode geometries, and a suitable geometry for the height and aperture size of the focusing electrode has also been obtained. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Field Emitter Array / Focusing electrode / Electrostatic lens / Paraaxial ray / Aberration coefficient / Brightness / / |
Reference Info. |
IEICE Tech. Rep. |
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