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Paper Abstract and Keywords
Presentation 2013-01-18 14:30
Analysis of drain leakage current in AlGaN/GaN HEMT
Kazuo Hayashi, Toshiyuki Oishi, Yoshitaka Kamo, Yutaro Yamaguchi, Hiroshi Otsuka, Koji Yamanaka, Masatoshi Nakayama (Mitsubishi Electric Corp.), Yasuyuki Miyamoto (Tokyo Institute of Technology) ED2012-125 MW2012-155 Link to ES Tech. Rep. Archives: ED2012-125 MW2012-155
Abstract (in Japanese) (See Japanese page) 
(in English) Traps in GaN layer of AlGaN/GaN HEMTs have been studied by using both experimental data and TCAD simulation. Two traps with activation energies of 0.15 and 0.5 eV are estimated from drain current versus drain voltage curves below pinch-off voltage at various temperatures. Furthermore, the drain leakage current is found to decrease as the trap density increases. From TCAD simulation, the decrease of the drain leakage current results from the increase of conduction band due to the traps with negative charges in GaN layer.
Keyword (in Japanese) (See Japanese page) 
(in English) AlGaN/GaN HEMT / trap / TCAD simulation / drain leakage current / / / /  
Reference Info. IEICE Tech. Rep., vol. 112, no. 380, ED2012-125, pp. 69-74, Jan. 2013.
Paper # ED2012-125 
Date of Issue 2013-01-10 (ED, MW) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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reproduction
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF ED2012-125 MW2012-155 Link to ES Tech. Rep. Archives: ED2012-125 MW2012-155

Conference Information
Committee MW ED  
Conference Date 2013-01-17 - 2013-01-18 
Place (in Japanese) (See Japanese page) 
Place (in English) Kikai-Shinko-Kaikan Bldg. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Compound Semiconductor IC, High-speed and high-frequency devices, Microwave Technologies, etc. 
Paper Information
Registration To ED 
Conference Code 2013-01-MW-ED 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Analysis of drain leakage current in AlGaN/GaN HEMT 
Sub Title (in English)  
Keyword(1) AlGaN/GaN HEMT  
Keyword(2) trap  
Keyword(3) TCAD simulation  
Keyword(4) drain leakage current  
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1st Author's Name Kazuo Hayashi  
1st Author's Affiliation Mitsubishi Electric Corporation (Mitsubishi Electric Corp.)
2nd Author's Name Toshiyuki Oishi  
2nd Author's Affiliation Mitsubishi Electric Corporation (Mitsubishi Electric Corp.)
3rd Author's Name Yoshitaka Kamo  
3rd Author's Affiliation Mitsubishi Electric Corporation (Mitsubishi Electric Corp.)
4th Author's Name Yutaro Yamaguchi  
4th Author's Affiliation Mitsubishi Electric Corporation (Mitsubishi Electric Corp.)
5th Author's Name Hiroshi Otsuka  
5th Author's Affiliation Mitsubishi Electric Corporation (Mitsubishi Electric Corp.)
6th Author's Name Koji Yamanaka  
6th Author's Affiliation Mitsubishi Electric Corporation (Mitsubishi Electric Corp.)
7th Author's Name Masatoshi Nakayama  
7th Author's Affiliation Mitsubishi Electric Corporation (Mitsubishi Electric Corp.)
8th Author's Name Yasuyuki Miyamoto  
8th Author's Affiliation Tokyo Institute of Technology (Tokyo Institute of Technology)
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Speaker Author-1 
Date Time 2013-01-18 14:30:00 
Presentation Time 25 minutes 
Registration for ED 
Paper # ED2012-125, MW2012-155 
Volume (vol) vol.112 
Number (no) no.380(ED), no.381(MW) 
Page pp.69-74 
#Pages
Date of Issue 2013-01-10 (ED, MW) 


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