Paper Abstract and Keywords |
Presentation |
2013-01-18 14:30
Analysis of drain leakage current in AlGaN/GaN HEMT Kazuo Hayashi, Toshiyuki Oishi, Yoshitaka Kamo, Yutaro Yamaguchi, Hiroshi Otsuka, Koji Yamanaka, Masatoshi Nakayama (Mitsubishi Electric Corp.), Yasuyuki Miyamoto (Tokyo Institute of Technology) ED2012-125 MW2012-155 Link to ES Tech. Rep. Archives: ED2012-125 MW2012-155 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Traps in GaN layer of AlGaN/GaN HEMTs have been studied by using both experimental data and TCAD simulation. Two traps with activation energies of 0.15 and 0.5 eV are estimated from drain current versus drain voltage curves below pinch-off voltage at various temperatures. Furthermore, the drain leakage current is found to decrease as the trap density increases. From TCAD simulation, the decrease of the drain leakage current results from the increase of conduction band due to the traps with negative charges in GaN layer. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
AlGaN/GaN HEMT / trap / TCAD simulation / drain leakage current / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 112, no. 380, ED2012-125, pp. 69-74, Jan. 2013. |
Paper # |
ED2012-125 |
Date of Issue |
2013-01-10 (ED, MW) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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ED2012-125 MW2012-155 Link to ES Tech. Rep. Archives: ED2012-125 MW2012-155 |
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