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Paper Abstract and Keywords
Presentation 2012-10-19 08:55
[Invited Talk] 5Tb/in2 Bit Patterned Media Fabricated by a Directed Self-Assembling Polymer Mask
Yoshiyuki Kamata, Tomoyuki Maeda, Hiroyuki Hieda, Ryosuke Yamamoto, Naoko Kihara, Akira Kikitsu (Toshiba corp.) MR2012-25 Link to ES Tech. Rep. Archives: MR2012-25
Abstract (in Japanese) (See Japanese page) 
(in English) FePt bit patterned media (BPM) was fabricated with a self-assembled polymer mask with 12 nm pitch (equivalent to 5 Tdot/inch2). A 3.2 nm FePt film with high c axis crystal orientation was prepared for the magnetic recording layer. A solvent vapor annealing was applied for uniform directed self-assembling of PS (Polystyrene)-PDMS (polydimethylsiloxane) diblock copolymer. Pattern transfer from a polymer mask to FePt layer was successfully achieved by employing a C hard mask. In spite of excellent magnetic characteristics of FePt layer, the fabricated FePt BPM showed small coercivity (Hc) of 6 kOe and large switching field distribution (SFD) of 21%. These results are due to the etching damage of FePt dots. Disordering of FePt L10 phase by the etching damage reduced magnetic anisotropy energy (Ku).
Keyword (in Japanese) (See Japanese page) 
(in English) bit patterned media / FePt / diblock copolymer / directed self-assembly / switching field distribution / HDD / /  
Reference Info. IEICE Tech. Rep., vol. 112, Oct. 2012.
Paper #  
Date of Issue 2012-10-11 (MR) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF MR2012-25 Link to ES Tech. Rep. Archives: MR2012-25

Conference Information
Committee MRIS ITE-MMS  
Conference Date 2012-10-18 - 2012-10-19 
Place (in Japanese) (See Japanese page) 
Place (in English) AIT 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Recording head, Spintronics, etc. 
Paper Information
Registration To MRIS 
Conference Code 2012-10-MR-MMS 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) 5Tb/in2 Bit Patterned Media Fabricated by a Directed Self-Assembling Polymer Mask 
Sub Title (in English)  
Keyword(1) bit patterned media  
Keyword(2) FePt  
Keyword(3) diblock copolymer  
Keyword(4) directed self-assembly  
Keyword(5) switching field distribution  
Keyword(6) HDD  
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Keyword(8)  
1st Author's Name Yoshiyuki Kamata  
1st Author's Affiliation Toshiba corporation (Toshiba corp.)
2nd Author's Name Tomoyuki Maeda  
2nd Author's Affiliation Toshiba corporation (Toshiba corp.)
3rd Author's Name Hiroyuki Hieda  
3rd Author's Affiliation Toshiba corporation (Toshiba corp.)
4th Author's Name Ryosuke Yamamoto  
4th Author's Affiliation Toshiba corporation (Toshiba corp.)
5th Author's Name Naoko Kihara  
5th Author's Affiliation Toshiba corporation (Toshiba corp.)
6th Author's Name Akira Kikitsu  
6th Author's Affiliation Toshiba corporation (Toshiba corp.)
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Speaker Author-1 
Date Time 2012-10-19 08:55:00 
Presentation Time 50 minutes 
Registration for MRIS 
Paper # MR2012-25 
Volume (vol) vol.112 
Number (no) no.249 
Page pp.43-48 
#Pages
Date of Issue 2012-10-11 (MR) 


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