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Paper Abstract and Keywords
Presentation 2012-06-27 17:30
Characterization of Optimized Sputtered Poly-Si Films by Blue-Multi-Laser-Diode Annealing for High Performance Displays
Takuma Nishinohara, J. D. Mugiraneza, Katsuya Shirai, Tatsuya Okada, Takashi Noguchi (Univ. of the Ryukyus)
Abstract (in Japanese) (See Japanese page) 
(in English) As a result of Blue-Multi-Laser-Diode Annealing (BLDA) for phosphorus-doped Si films deposited by R.F. sputtering using Ar or Ne gas, the crystallinity improved and smooth surface was obtained by optimizing the deposition condition. In the case of Ne gas, the crystallinity was improved drastically and surface roughness increased. BLDA for the optimized sputtered Si films is promising for next generation low-temperature poly-Si (LTPS) process and for the realization of high performance integrated AM-OLED on plastic as well as on glass.
Keyword (in Japanese) (See Japanese page) 
(in English) Blue-Multi-Laser-Diode Annealing / Si / sputtering / LTPS / / / /  
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Conference Information
Committee SDM ED  
Conference Date 2012-06-27 - 2012-06-29 
Place (in Japanese) (See Japanese page) 
Place (in English) Okinawa Seinen-kaikan 
Topics (in Japanese) (See Japanese page) 
Topics (in English) 2012 Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices 
Paper Information
Registration To SDM 
Conference Code 2012-06-SDM-ED 
Language English 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Characterization of Optimized Sputtered Poly-Si Films by Blue-Multi-Laser-Diode Annealing for High Performance Displays 
Sub Title (in English)  
Keyword(1) Blue-Multi-Laser-Diode Annealing  
Keyword(2) Si  
Keyword(3) sputtering  
Keyword(4) LTPS  
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1st Author's Name Takuma Nishinohara  
1st Author's Affiliation University of the Ryukyus (Univ. of the Ryukyus)
2nd Author's Name J. D. Mugiraneza  
2nd Author's Affiliation University of the Ryukyus (Univ. of the Ryukyus)
3rd Author's Name Katsuya Shirai  
3rd Author's Affiliation University of the Ryukyus (Univ. of the Ryukyus)
4th Author's Name Tatsuya Okada  
4th Author's Affiliation University of the Ryukyus (Univ. of the Ryukyus)
5th Author's Name Takashi Noguchi  
5th Author's Affiliation University of the Ryukyus (Univ. of the Ryukyus)
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Speaker Author-1 
Date Time 2012-06-27 17:30:00 
Presentation Time 15 minutes 
Registration for SDM 
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