Paper Abstract and Keywords |
Presentation |
2012-02-08 09:30
Observation of Conductance Quantization during SPM Scratching Ryutaro Suda, Takahiro Ohyama, Jun-ichi Shirakashi (Tokyo Univ. of Agr. & Tech) ED2011-150 SDM2011-167 Link to ES Tech. Rep. Archives: ED2011-150 SDM2011-167 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Quantum point contacts (QPCs) are formed by mechanically scratching Au channels with a scanning probe microscope (SPM) in ambient condition. A variation of electrical properties of the Au channels was caused by a direct modification of the channels using SPM scratching and was in-situ controlled by measuring the conductance across the scratched region. Such measurement provides a more accurate method of controlling device properties than by controlling geometry alone. Initial Au channels with width of a few micrometers were fabricated by conventional electron-beam lithography and lift-off process. Scratch experiments were carried out using a diamond-coated tip in ambient air. Then, the SPM scratching was performed across the Au channels. The electrical properties of the Au channels were measured in-situ during the SPM scratching. The conductance of the Au channel was slowly decreased with the increase of process time as the channel was constricted by the scratching. The conductance changed in quantized steps of the conductance quantum, G0 = 2e2/h at final stage of the SPM scratching. This result suggests that atomic-size contact is formed by SPM scratching. Furthermore, the conductance varies stepwise with time and exhibits clear plateaus by tuning the scan speed of the SPM tip. These results imply that SPM scratch nanolithography is promising for the fabrication of nanoscale devices consisting of QPCs. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
scanning probe microscopy / scratch / in-situ measurement / quantum point contact / conductance quantization / / / |
Reference Info. |
IEICE Tech. Rep., vol. 111, no. 425, ED2011-150, pp. 47-52, Feb. 2012. |
Paper # |
ED2011-150 |
Date of Issue |
2012-01-31 (ED, SDM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
ED2011-150 SDM2011-167 Link to ES Tech. Rep. Archives: ED2011-150 SDM2011-167 |
Conference Information |
Committee |
ED SDM |
Conference Date |
2012-02-07 - 2012-02-08 |
Place (in Japanese) |
(See Japanese page) |
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Paper Information |
Registration To |
ED |
Conference Code |
2012-02-ED-SDM |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Observation of Conductance Quantization during SPM Scratching |
Sub Title (in English) |
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Keyword(1) |
scanning probe microscopy |
Keyword(2) |
scratch |
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in-situ measurement |
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quantum point contact |
Keyword(5) |
conductance quantization |
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1st Author's Name |
Ryutaro Suda |
1st Author's Affiliation |
Tokyo University of Agriculture and Technology (Tokyo Univ. of Agr. & Tech) |
2nd Author's Name |
Takahiro Ohyama |
2nd Author's Affiliation |
Tokyo University of Agriculture and Technology (Tokyo Univ. of Agr. & Tech) |
3rd Author's Name |
Jun-ichi Shirakashi |
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Tokyo University of Agriculture and Technology (Tokyo Univ. of Agr. & Tech) |
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Speaker |
Author-1 |
Date Time |
2012-02-08 09:30:00 |
Presentation Time |
25 minutes |
Registration for |
ED |
Paper # |
ED2011-150, SDM2011-167 |
Volume (vol) |
vol.111 |
Number (no) |
no.425(ED), no.426(SDM) |
Page |
pp.47-52 |
#Pages |
6 |
Date of Issue |
2012-01-31 (ED, SDM) |
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