Paper Abstract and Keywords |
Presentation |
2011-11-29 17:00
[Keynote Address]
Lithography : past, present, and future Shigeki Nojima (Toshiba) VLD2011-81 CPM2011-161 ICD2011-93 CPSY2011-48 DC2011-57 RECONF2011-49 Link to ES Tech. Rep. Archives: CPM2011-161 ICD2011-93 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Lithography is one of the key technologies for semiconductor device shrink. For example, wave length
becomes shorter and numerical aperture becomes larger with advanced exposure tools to meet the device shrink
requirements. However, as the device shrink continues, it is harder to meet the requirements by lithography technology
only. This is the reason why total optimization concept is introduced. The concept considers several metrics and/or several different technologies at the same time to improve a yield and to reduce a pattern size. DFM is one of the total optimization methods and it provides a layout methodology corresponding to process performance.
In this paper, we will review the history of lithography and device shrink trend and also will discuss the total optimization concept along with several examples which the proposed concept is applied to. Furthermore we will discuss the goal of total optimization concept with the future trend of lithography technology. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
lithography / Design for manufacturability / DFM / Total optimization / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 111, no. 324, VLD2011-81, pp. 171-171, Nov. 2011. |
Paper # |
VLD2011-81 |
Date of Issue |
2011-11-21 (VLD, CPM, ICD, DC, RECONF), 2011-11-22 (CPSY) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
VLD2011-81 CPM2011-161 ICD2011-93 CPSY2011-48 DC2011-57 RECONF2011-49 Link to ES Tech. Rep. Archives: CPM2011-161 ICD2011-93 |
Conference Information |
Committee |
VLD DC IPSJ-SLDM CPSY RECONF ICD CPM |
Conference Date |
2011-11-28 - 2011-11-30 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
NewWelCity Miyazaki |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Design Gaia 2010 -New Field of VLSI Design- |
Paper Information |
Registration To |
VLD |
Conference Code |
2011-11-VLD-DC-SLDM-CPSY-RECONF-ICD-CPM |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Lithography : past, present, and future |
Sub Title (in English) |
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lithography |
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Design for manufacturability |
Keyword(3) |
DFM |
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Total optimization |
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1st Author's Name |
Shigeki Nojima |
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TOSHIBA Corporation (Toshiba) |
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Speaker |
Author-1 |
Date Time |
2011-11-29 17:00:00 |
Presentation Time |
60 minutes |
Registration for |
VLD |
Paper # |
VLD2011-81, CPM2011-161, ICD2011-93, CPSY2011-48, DC2011-57, RECONF2011-49 |
Volume (vol) |
vol.111 |
Number (no) |
no.324(VLD), no.326(CPM), no.327(ICD), no.328(CPSY), no.325(DC), no.323(RECONF) |
Page |
p.171(VLD), p.65(CPM), p.65(ICD), p.33(CPSY), p.171(DC), p.45(RECONF) |
#Pages |
1 |
Date of Issue |
2011-11-21 (VLD, CPM, ICD, DC, RECONF), 2011-11-22 (CPSY) |
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