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Paper Abstract and Keywords
Presentation 2011-11-29 17:00
[Keynote Address] Lithography : past, present, and future
Shigeki Nojima (Toshiba) VLD2011-81 CPM2011-161 ICD2011-93 CPSY2011-48 DC2011-57 RECONF2011-49 Link to ES Tech. Rep. Archives: CPM2011-161 ICD2011-93
Abstract (in Japanese) (See Japanese page) 
(in English) Lithography is one of the key technologies for semiconductor device shrink. For example, wave length
becomes shorter and numerical aperture becomes larger with advanced exposure tools to meet the device shrink
requirements. However, as the device shrink continues, it is harder to meet the requirements by lithography technology
only. This is the reason why total optimization concept is introduced. The concept considers several metrics and/or several different technologies at the same time to improve a yield and to reduce a pattern size. DFM is one of the total optimization methods and it provides a layout methodology corresponding to process performance.
In this paper, we will review the history of lithography and device shrink trend and also will discuss the total optimization concept along with several examples which the proposed concept is applied to. Furthermore we will discuss the goal of total optimization concept with the future trend of lithography technology.
Keyword (in Japanese) (See Japanese page) 
(in English) lithography / Design for manufacturability / DFM / Total optimization / / / /  
Reference Info. IEICE Tech. Rep., vol. 111, no. 324, VLD2011-81, pp. 171-171, Nov. 2011.
Paper # VLD2011-81 
Date of Issue 2011-11-21 (VLD, CPM, ICD, DC, RECONF), 2011-11-22 (CPSY) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
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reproduction
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF VLD2011-81 CPM2011-161 ICD2011-93 CPSY2011-48 DC2011-57 RECONF2011-49 Link to ES Tech. Rep. Archives: CPM2011-161 ICD2011-93

Conference Information
Committee VLD DC IPSJ-SLDM CPSY RECONF ICD CPM  
Conference Date 2011-11-28 - 2011-11-30 
Place (in Japanese) (See Japanese page) 
Place (in English) NewWelCity Miyazaki 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Design Gaia 2010 -New Field of VLSI Design- 
Paper Information
Registration To VLD 
Conference Code 2011-11-VLD-DC-SLDM-CPSY-RECONF-ICD-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Lithography : past, present, and future 
Sub Title (in English)  
Keyword(1) lithography  
Keyword(2) Design for manufacturability  
Keyword(3) DFM  
Keyword(4) Total optimization  
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1st Author's Name Shigeki Nojima  
1st Author's Affiliation TOSHIBA Corporation (Toshiba)
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Speaker Author-1 
Date Time 2011-11-29 17:00:00 
Presentation Time 60 minutes 
Registration for VLD 
Paper # VLD2011-81, CPM2011-161, ICD2011-93, CPSY2011-48, DC2011-57, RECONF2011-49 
Volume (vol) vol.111 
Number (no) no.324(VLD), no.326(CPM), no.327(ICD), no.328(CPSY), no.325(DC), no.323(RECONF) 
Page p.171(VLD), p.65(CPM), p.65(ICD), p.33(CPSY), p.171(DC), p.45(RECONF) 
#Pages
Date of Issue 2011-11-21 (VLD, CPM, ICD, DC, RECONF), 2011-11-22 (CPSY) 


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