Paper Abstract and Keywords |
Presentation |
2011-11-29 13:00
Layout Methodology for Self-Alinged Double Patterning Chikaaki Kodama, Koichi Nakayama, Toshiya Kotani, Shigeki Nojima, Shoji Mimotogi, Shinji Miyamoto (Toshiba) VLD2011-76 DC2011-52 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
We propose a new layout method for the damascene process of
self-aligned double patterning (SADP).
In this method, we prepare a fundamental layout data painted
in different two colors interchangeably.
We can connect arbitrary patterns of one color of the two and
at the same time, patterns of the other color will be cut to avoid two
colors' crossing each other.
Additionally, we can also cut arbitrary patterns in the layout.
According to the above connecting and cutting rules, the two colors in the resultant patterns are kept as initially colored interchangeablly, and we can select either of the two colored patterns as mandrel. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Lithography / Double patterning / Sidewall process / Self-aligned double patterning / SADP / Layout design / / |
Reference Info. |
IEICE Tech. Rep., vol. 111, no. 324, VLD2011-76, pp. 141-146, Nov. 2011. |
Paper # |
VLD2011-76 |
Date of Issue |
2011-11-21 (VLD, DC) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
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VLD2011-76 DC2011-52 |
Conference Information |
Committee |
VLD DC IPSJ-SLDM CPSY RECONF ICD CPM |
Conference Date |
2011-11-28 - 2011-11-30 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
NewWelCity Miyazaki |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Design Gaia 2010 -New Field of VLSI Design- |
Paper Information |
Registration To |
VLD |
Conference Code |
2011-11-VLD-DC-SLDM-CPSY-RECONF-ICD-CPM |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Layout Methodology for Self-Alinged Double Patterning |
Sub Title (in English) |
|
Keyword(1) |
Lithography |
Keyword(2) |
Double patterning |
Keyword(3) |
Sidewall process |
Keyword(4) |
Self-aligned double patterning |
Keyword(5) |
SADP |
Keyword(6) |
Layout design |
Keyword(7) |
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Keyword(8) |
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1st Author's Name |
Chikaaki Kodama |
1st Author's Affiliation |
Toshiba Corporation (Toshiba) |
2nd Author's Name |
Koichi Nakayama |
2nd Author's Affiliation |
Toshiba Corporation (Toshiba) |
3rd Author's Name |
Toshiya Kotani |
3rd Author's Affiliation |
Toshiba Corporation (Toshiba) |
4th Author's Name |
Shigeki Nojima |
4th Author's Affiliation |
Toshiba Corporation (Toshiba) |
5th Author's Name |
Shoji Mimotogi |
5th Author's Affiliation |
Toshiba Corporation (Toshiba) |
6th Author's Name |
Shinji Miyamoto |
6th Author's Affiliation |
Toshiba Corporation (Toshiba) |
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Speaker |
Author-1 |
Date Time |
2011-11-29 13:00:00 |
Presentation Time |
25 minutes |
Registration for |
VLD |
Paper # |
VLD2011-76, DC2011-52 |
Volume (vol) |
vol.111 |
Number (no) |
no.324(VLD), no.325(DC) |
Page |
pp.141-146 |
#Pages |
6 |
Date of Issue |
2011-11-21 (VLD, DC) |
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