Paper Abstract and Keywords |
Presentation |
2011-05-19 13:50
Molecular beam epitaxy growth of AlGaPN alloys for optical confinement structure on Si substrate Keisuke Kumagai, Kohei Shoji, Tsuyoshi Kawai, Keisuke Yamane, Hiroto Sekiguchi, Hiroshi Okada, Akihiro Wakahara (Toyohashi Univ.Tech.) ED2011-10 CPM2011-17 SDM2011-23 Link to ES Tech. Rep. Archives: ED2011-10 CPM2011-17 SDM2011-23 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
An AlP-based dilute nitride is one of the candidates for the cladding layer of laser structure in a Si-based optoelectronic integrated circuits (OEIC). In order to design the optical confinement structure, growth properties and optical constants of AlGaPN have been investigated. Nitrogen incorporation efficiency is increased by adding Al contents, but shows small effect of the growth temperatures. A high quality AlGaPN which can be lattice matched to Si obtained at the growth temperature of 600 °C. The refractive indexes of AlGaPN with the N concentration of a few % are almost the same an AlGaP. Finally AlPN/GaPN DBR is fabricated. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
OEIC / III-V-N alloys / GaPN / AlPN / Optical confinement structure / DBR / / |
Reference Info. |
IEICE Tech. Rep., vol. 111, no. 44, ED2011-10, pp. 49-54, May 2011. |
Paper # |
ED2011-10 |
Date of Issue |
2011-05-12 (ED, CPM, SDM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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ED2011-10 CPM2011-17 SDM2011-23 Link to ES Tech. Rep. Archives: ED2011-10 CPM2011-17 SDM2011-23 |
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