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| Presentation | 2010-12-17 11:40 Optimization of Laser Doping by Controlled Dopant Precursor Layer in Silicon Solar Cell Process Tomohiro Funatani, Kenji Hirata, Tamaki Takayama, Mitsuhiro Hasegawa, Takashi Fuyuki (NAIST)  SDM2010-190 Link to ES Tech. Rep. Archives: SDM2010-190 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | This paper presents influence of dopant precursor layer in Laser Doping (LD) for silicon solar cells. Recently，reducing costs and high-efficiency technology of crystalline silicon solar cells is important．LD process permit these tasks. The purpose of this research is to analyze physical properties of PSG made by sputtering method and doping properties after LD. We also analyzed surface of substrate after laser irradiation，the dependence of PSG thickness for surface，dopant depth and concentration after LD. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | Laser Doping / Solar Cells / Phosphorus Silicate Glass (PSG) / / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 110, no. 351, SDM2010-190, pp. 29-32, Dec. 2010. | |
| Paper # | SDM2010-190 | |
| Date of Issue | 2010-12-10 (SDM) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | SDM2010-190 Link to ES Tech. Rep. Archives: SDM2010-190 |
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| Conference Information | |
| Committee | SDM |
| Conference Date | 2010-12-17 - 2010-12-17 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Kyoto Univ. (Katsura) |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Fabrication and Characterization of Si and Si-related Materials |
| Paper Information | |
| Registration To | SDM |
| Conference Code | 2010-12-SDM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Optimization of Laser Doping by Controlled Dopant Precursor Layer in Silicon Solar Cell Process |
| Sub Title (in English) | |
| Keyword(1) | Laser Doping |
| Keyword(2) | Solar Cells |
| Keyword(3) | Phosphorus Silicate Glass (PSG) |
| Keyword(4) | |
| Keyword(5) | |
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| Keyword(8) | |
| 1st Author's Name | Tomohiro Funatani |
| 1st Author's Affiliation | Nara Institute of Science and Technology (NAIST) |
| 2nd Author's Name | Kenji Hirata |
| 2nd Author's Affiliation | Nara Institute of Science and Technology (NAIST) |
| 3rd Author's Name | Tamaki Takayama |
| 3rd Author's Affiliation | Nara Institute of Science and Technology (NAIST) |
| 4th Author's Name | Mitsuhiro Hasegawa |
| 4th Author's Affiliation | Nara Institute of Science and Technology (NAIST) |
| 5th Author's Name | Takashi Fuyuki |
| 5th Author's Affiliation | Nara Institute of Science and Technology (NAIST) |
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| Speaker | Author-1 |
| Date Time | 2010-12-17 11:40:00 |
| Presentation Time | 20 minutes |
| Registration for | SDM |
| Paper # | SDM2010-190 |
| Volume (vol) | vol.110 |
| Number (no) | no.351 |
| Page | pp.29-32 |
| #Pages | 4 |
| Date of Issue | 2010-12-10 (SDM) |
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