Paper Abstract and Keywords |
Presentation |
2010-12-17 15:10
Fabrication of PMMA waveguide devices using focused proton beam Kenta Miura (Gunma Univ.), Takahiro Satoh, Masashi Koka, Yasuyuki Ishii, Katsuyoshi Takano, Takeru Ohkubo, Wataru Kada, Akiyoshi Yamazaki, Akihito Yokoyama, Tomihiro Kamiya (JAEA), Masato Uehara, Hiromu Kiryu, Tomoyuki Sasaki, Osamu Hanaizumi (Gunma Univ.), Hiroyuki Nishikawa (Shibaura Inst. Tech.) OPE2010-136 Link to ES Tech. Rep. Archives: OPE2010-136 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Proton beam writing (PBW) attracts recently much attention as a next-generation micro-fabrication technology. It is a direct writing technique and does not need any masks to transfer micro-patterns to sample surfaces. The refractive index of a poly(methyl methacralate) (PMMA) can be increased by proton irradiation. We have already succeeded in fabricating single-mode line waveguides for a wavelength of 1550 nm using this technique. In this study, we fabricated Y-junction polymer waveguides consisting of PMMA layers by using the PBW technique. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Proton Beam Writing / PMMA / Single-Mode Waveguide / Y-Junction Waveguide / Optical Switch / / / |
Reference Info. |
IEICE Tech. Rep., vol. 110, no. 352, OPE2010-136, pp. 27-30, Dec. 2010. |
Paper # |
OPE2010-136 |
Date of Issue |
2010-12-10 (OPE) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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OPE2010-136 Link to ES Tech. Rep. Archives: OPE2010-136 |
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