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Paper Abstract and Keywords
Presentation 2010-11-12 10:00
Characterization of insulated gates on GaN and AlGaN/GaN structures
Yujin Hori, Naohisa Harada, Chihoko Mizue, Tamotsu Hashizume (Hokkaido Univ.) ED2010-154 CPM2010-120 LQE2010-110 Link to ES Tech. Rep. Archives: ED2010-154 CPM2010-120 LQE2010-110
Abstract (in Japanese) (See Japanese page) 
(in English) We investigated the interface and electrical properties of insulated gates fabricated on GaN and AlGaN/GaN structures using atomic layer deposited Al2O3 and electrochemical oxide films. The annealing process at 800 oC brought a large number of microcrystallization regions into the Al2O3 layer, causing a marked leakage in the current-voltage characteristics of the Al2O3/n-GaN structure. The “ohmic-first” process with a SiN protection layer suppressed leakage current and realized low electronic state densities at the Al2O3/n-GaN interface. The electrochemical oxidation process was applied to AlGaN/GaN HEMT structure. The formation of the recessed oxide gate structure realized a low gate leakage current and a normally-off operation.
Keyword (in Japanese) (See Japanese page) 
(in English) AlGaN / GaN / Al2O3 / MOS / normally-off / / /  
Reference Info. IEICE Tech. Rep., vol. 110, no. 271, ED2010-154, pp. 55-58, Nov. 2010.
Paper # ED2010-154 
Date of Issue 2010-11-04 (ED, CPM, LQE) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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Download PDF ED2010-154 CPM2010-120 LQE2010-110 Link to ES Tech. Rep. Archives: ED2010-154 CPM2010-120 LQE2010-110

Conference Information
Committee CPM LQE ED  
Conference Date 2010-11-11 - 2010-11-12 
Place (in Japanese) (See Japanese page) 
Place (in English)  
Topics (in Japanese) (See Japanese page) 
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Paper Information
Registration To ED 
Conference Code 2010-11-CPM-LQE-ED 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Characterization of insulated gates on GaN and AlGaN/GaN structures 
Sub Title (in English)  
Keyword(1) AlGaN  
Keyword(2) GaN  
Keyword(3) Al2O3  
Keyword(4) MOS  
Keyword(5) normally-off  
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Keyword(8)  
1st Author's Name Yujin Hori  
1st Author's Affiliation Hokkaido University (Hokkaido Univ.)
2nd Author's Name Naohisa Harada  
2nd Author's Affiliation Hokkaido University (Hokkaido Univ.)
3rd Author's Name Chihoko Mizue  
3rd Author's Affiliation Hokkaido University (Hokkaido Univ.)
4th Author's Name Tamotsu Hashizume  
4th Author's Affiliation Hokkaido University (Hokkaido Univ.)
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Speaker Author-1 
Date Time 2010-11-12 10:00:00 
Presentation Time 25 minutes 
Registration for ED 
Paper # ED2010-154, CPM2010-120, LQE2010-110 
Volume (vol) vol.110 
Number (no) no.271(ED), no.272(CPM), no.273(LQE) 
Page pp.55-58 
#Pages
Date of Issue 2010-11-04 (ED, CPM, LQE) 


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