Paper Abstract and Keywords |
Presentation |
2010-11-12 11:20
Development of Automated System of Ultra-Accelerated Quantum Chemical Molecular Dynamics Method and Oxidation Simulation of Silicon Surface Hideyuki Tsuboi, Kenji Inaba, Mariko Ise, Yukie Hayashi, Yuka Suzuki, Hiromi Sato, Yukiko Obara, Ryo Nagumo, Ryuji Miura, Ai Suzuki, Nozomu Hatakeyama, Akira Endou, Hiromitsu Takaba, Momoji Kubo, Akira Miyamoto (Tohoku) SDM2010-178 Link to ES Tech. Rep. Archives: SDM2010-178 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Using our newly developed automated system of ultra-accelerated quantum chemical molecular dynamics method, we have investigated the initial process for dry, wet and radical oxidation reaction of silicon surface. In this report, we have analyzed the behavior of reactant molecules during the surface chemical reaction |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Silicon surface / / / / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 110, no. 274, SDM2010-178, pp. 41-43, Nov. 2010. |
Paper # |
SDM2010-178 |
Date of Issue |
2010-11-04 (SDM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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SDM2010-178 Link to ES Tech. Rep. Archives: SDM2010-178 |
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