Paper Abstract and Keywords |
Presentation |
2010-10-22 13:25
Deposition polymerization of fluoropolymer thin films by ion-assisted vapor deposition Tsuyoshi Matsuda (Tokyo Univ. Agricul. & Technol.), Kazuo Senda (Sumitomo Precision), Kuniaki Tanaka, Hiroaki Usui (Tokyo Univ. Agricul. & Technol.) OME2010-47 Link to ES Tech. Rep. Archives: OME2010-47 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Ion-assisted deposition was employed as a new technique for preparing fuluoropolymer thin films. A fluorinated alkylacrylate monomer was deposited on the substrate surface under irradiation of low energy Ar ions. As a consequence, highly hydrophobic fluoropolymer thin films were obtained. However, no films were accumulated when the monomer was deposited without ion irradiation. The films deposited on Au surface had excellent smoothness. On the other hand, the films deposited on glass substrate had considerable extrusions due probably to coagulation of monomer residue. The roughness was improved by rinsing the film with HCFC-225 solvent. By depositing a 100-nm thick film on glass surface, the reflectance was reduced from 8% to 3%. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
ion-assisted deposition / deposition polymerization / fluoropolymer / fluorinated alkylacrylate / antireflective coating / / / |
Reference Info. |
IEICE Tech. Rep., vol. 110, no. 243, OME2010-47, pp. 5-10, Oct. 2010. |
Paper # |
OME2010-47 |
Date of Issue |
2010-10-15 (OME) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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OME2010-47 Link to ES Tech. Rep. Archives: OME2010-47 |
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