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Paper Abstract and Keywords
Presentation 2010-09-29 14:50
Evaluation of Fictive Temperature of Synthetic Silica Glasses by the Ultrasonic Microspectroscopy Technology
Jun-ichi Kushibiki, Mototaka Arakawa, Yuji Ohashi, Yuko Maruyama, Takanori Kondo, Tetsuo Yoshida (Tohoku Univ.) US2010-52
Abstract (in Japanese) (See Japanese page) 
(in English) We developed an evaluation method of fictive temperatures TF for synthetic silica (SiO2) glasses by the ultrasonic micro-spectroscopy technology. Specimens prepared from two kinds of commercial SiO2 glasses with different OH concentrations were heat-treated at desired annealing temperatures from 900 to 1200°C. Longitudinal and shear velocities (Vl and Vs), leaky surface acoustic wave (LSAW) velocities (VLSAW), and densities (ρ) were measured. Vl varied most significantly among the acoustic properties. TF dependences of acoustic properties were obtained from relationships between Vl and ρ, which was reported that it is in a linear relationship with TF. Different TF dependences were detected for the two types of SiO2 glasses because of different OH concentrations. The resolutions were 0.3-0.4°C, and they were 40-150 times higher than the conventional methods using Raman spectroscopy and infrared spectroscopy. VLSAW measurements can provide two-dimensional TF distributions on the specimen surface with resolutions of about 10°C. This ultrasonic method is extremely useful for TF evaluation for SiO2 glasses.
Keyword (in Japanese) (See Japanese page) 
(in English) ultrasonic micro-spectroscopy technology / synthetic silica glass / fictive temperature / longitudinal velocity / shear velocity / leaky surface acoustic wave velocity / density /  
Reference Info. IEICE Tech. Rep., vol. 110, no. 213, US2010-52, pp. 23-28, Sept. 2010.
Paper # US2010-52 
Date of Issue 2010-09-22 (US) 
ISSN Print edition: ISSN 0913-5685  Online edition: ISSN 2432-6380
Copyright
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reproduction
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee US  
Conference Date 2010-09-29 - 2010-09-30 
Place (in Japanese) (See Japanese page) 
Place (in English) Tohoku Univ. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) General 
Paper Information
Registration To US 
Conference Code 2010-09-US 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Evaluation of Fictive Temperature of Synthetic Silica Glasses by the Ultrasonic Microspectroscopy Technology 
Sub Title (in English)  
Keyword(1) ultrasonic micro-spectroscopy technology  
Keyword(2) synthetic silica glass  
Keyword(3) fictive temperature  
Keyword(4) longitudinal velocity  
Keyword(5) shear velocity  
Keyword(6) leaky surface acoustic wave velocity  
Keyword(7) density  
Keyword(8)  
1st Author's Name Jun-ichi Kushibiki  
1st Author's Affiliation Tohoku University (Tohoku Univ.)
2nd Author's Name Mototaka Arakawa  
2nd Author's Affiliation Tohoku University (Tohoku Univ.)
3rd Author's Name Yuji Ohashi  
3rd Author's Affiliation Tohoku University (Tohoku Univ.)
4th Author's Name Yuko Maruyama  
4th Author's Affiliation Tohoku University (Tohoku Univ.)
5th Author's Name Takanori Kondo  
5th Author's Affiliation Tohoku University (Tohoku Univ.)
6th Author's Name Tetsuo Yoshida  
6th Author's Affiliation Tohoku University (Tohoku Univ.)
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Speaker
Date Time 2010-09-29 14:50:00 
Presentation Time 25 
Registration for US 
Paper # IEICE-US2010-52 
Volume (vol) IEICE-110 
Number (no) no.213 
Page pp.23-28 
#Pages IEICE-6 
Date of Issue IEICE-US-2010-09-22 


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