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| Presentation | 2010-07-02 16:00 Characteristic of Dual-Gate Single Electron Transistor (DG-SET) with extended channel using shallow doping and sidewall patterning for suppressing MOS current Joung-eob Lee, Kwon-Chil Kang, Jung Han Lee, Kim Kyung Wan, Byung-Gook Park (Seoul National Univ.)  ED2010-121 SDM2010-122 Link to ES Tech. Rep. Archives: ED2010-121 SDM2010-122 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | (Not available yet) | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | / / / / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 110, no. 110, SDM2010-122, pp. 315-318, June 2010. | |
| Paper # | SDM2010-122 | |
| Date of Issue | 2010-06-23 (ED, SDM) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | ED2010-121 SDM2010-122 Link to ES Tech. Rep. Archives: ED2010-121 SDM2010-122 |
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| Conference Information | |
| Committee | ED SDM |
| Conference Date | 2010-06-30 - 2010-07-02 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Tokyo Inst. of Tech. Ookayama Campus |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | 2010 Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices |
| Paper Information | |
| Registration To | SDM |
| Conference Code | 2010-06-ED-SDM |
| Language | English |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Characteristic of Dual-Gate Single Electron Transistor (DG-SET) with extended channel using shallow doping and sidewall patterning for suppressing MOS current |
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| 1st Author's Name | Joung-eob Lee |
| 1st Author's Affiliation | Seoul National University (Seoul National Univ.) |
| 2nd Author's Name | Kwon-Chil Kang |
| 2nd Author's Affiliation | Seoul National University (Seoul National Univ.) |
| 3rd Author's Name | Jung Han Lee |
| 3rd Author's Affiliation | Seoul National University (Seoul National Univ.) |
| 4th Author's Name | Kim Kyung Wan |
| 4th Author's Affiliation | Seoul National University (Seoul National Univ.) |
| 5th Author's Name | Byung-Gook Park |
| 5th Author's Affiliation | Seoul National University (Seoul National Univ.) |
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| Speaker | Author-1 |
| Date Time | 2010-07-02 16:00:00 |
| Presentation Time | 15 minutes |
| Registration for | SDM |
| Paper # | ED2010-121, SDM2010-122 |
| Volume (vol) | vol.110 |
| Number (no) | no.109(ED), no.110(SDM) |
| Page | pp.315-318 |
| #Pages | 4 |
| Date of Issue | 2010-06-23 (ED, SDM) |
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