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| Presentation | 2010-02-22 16:05 Fabrication of Planar-Type Ferromagnetic Tunnel Junctions Using Field-Emission-Induced Electromigration Kazutoshi Takiya, Yusuke Tomoda, Takato Watanabe, Watari Kume, Shunsuke Ueno, Jun-ichi Shirakashi (Tokyo Univ. of Agr. & Tech)  ED2009-203 SDM2009-200 Link to ES Tech. Rep. Archives: ED2009-203 SDM2009-200 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | We study nanometer-sized spintronic devices with ferromagnetic tunnel junctions. Tunnel magnetoresitance (TMR) observed in the devices has been extensively investigated both experimentally and theoretically. Here, we fabricated planar-type Ni-vacuum-Ni ferromagnetic tunnel junctions, whose geometry is asymmetrically butterfly-shaped for inducing the magnetic shape anisotropy, using field-emission-induced electromigration (so-called “activation”). In the activation method, we were simply and easily able to control the tunnel resitance from 1.6 MΩ to 169 kΩ by only adjusting the magnitude of field emission current, resulting in a decrease of the initial nanogap separation from approximately 40 nm to less than 10 nm. Therefore, the activation technique is most important for the formation of planar-type Ni-vaccum-Ni ferromagnetic tunnel junctions. The resistance of the junctions formed by the activation was varied by external magnetic fields, and the magnetoresistance (MR) ratio of approximately 12.2 % was obtained at 16 K with the bias voltage of 0.72 mV. With increasing the bias voltage from 0.72 to 7.3 mV, the MR ratio decreased from 12.2 to 6.2 %. When the applied bias voltage was fixed at 1.6 mV, the MR ratio also decreased from 11.6 % to 1.2 % with increasing the measurement temperature from 16 to 270 K. These results strongly suggest that activation method can be useful to easily fabricate planar-type ferromagnetic tunnel junctions. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | eletromigration / field emission current / ferromagnetic tunnel junction / magnetoresistance / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 109, no. 422, ED2009-203, pp. 41-45, Feb. 2010. | |
| Paper # | ED2009-203 | |
| Date of Issue | 2010-02-15 (ED, SDM) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | ED2009-203 SDM2009-200 Link to ES Tech. Rep. Archives: ED2009-203 SDM2009-200 |
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| Conference Information | |
| Committee | ED SDM |
| Conference Date | 2010-02-22 - 2010-02-23 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Okinawaken-Seinen-Kaikan |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Functional Nano Device and Related Technology |
| Paper Information | |
| Registration To | ED |
| Conference Code | 2010-02-ED-SDM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Fabrication of Planar-Type Ferromagnetic Tunnel Junctions Using Field-Emission-Induced Electromigration |
| Sub Title (in English) | |
| Keyword(1) | eletromigration |
| Keyword(2) | field emission current |
| Keyword(3) | ferromagnetic tunnel junction |
| Keyword(4) | magnetoresistance |
| Keyword(5) | |
| Keyword(6) | |
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| Keyword(8) | |
| 1st Author's Name | Kazutoshi Takiya |
| 1st Author's Affiliation | Tokyo University of Agriculture and Technology (Tokyo Univ. of Agr. & Tech) |
| 2nd Author's Name | Yusuke Tomoda |
| 2nd Author's Affiliation | Tokyo University of Agriculture and Technology (Tokyo Univ. of Agr. & Tech) |
| 3rd Author's Name | Takato Watanabe |
| 3rd Author's Affiliation | Tokyo University of Agriculture and Technology (Tokyo Univ. of Agr. & Tech) |
| 4th Author's Name | Watari Kume |
| 4th Author's Affiliation | Tokyo University of Agriculture and Technology (Tokyo Univ. of Agr. & Tech) |
| 5th Author's Name | Shunsuke Ueno |
| 5th Author's Affiliation | Tokyo University of Agriculture and Technology (Tokyo Univ. of Agr. & Tech) |
| 6th Author's Name | Jun-ichi Shirakashi |
| 6th Author's Affiliation | Tokyo University of Agriculture and Technology (Tokyo Univ. of Agr. & Tech) |
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| Speaker | Author-1 |
| Date Time | 2010-02-22 16:05:00 |
| Presentation Time | 25 minutes |
| Registration for | ED |
| Paper # | ED2009-203, SDM2009-200 |
| Volume (vol) | vol.109 |
| Number (no) | no.422(ED), no.423(SDM) |
| Page | pp.41-45 |
| #Pages | 5 |
| Date of Issue | 2010-02-15 (ED, SDM) |
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