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| Presentation | 2009-11-13 11:15 A Novel Monte Carlo Simulation to Evaluate the Size Effect of Resistivity for Scaled Metallic Interconnects Takashi Kurusu, Makoto Wada, Noriaki Matsunaga, Akihiro Kajita, Hiroyoshi Tanimoto, Nobutoshi Aoki, Yoshiaki Toyoshima, Hideki Shibata (Toshiba Corp.)  SDM2009-145 Link to ES Tech. Rep. Archives: SDM2009-145 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | Recently, the size effect on resistivity in very narrow and thin metallic wires is a crucial problem on development of small-scaled metallic interconnects. In this paper, we present a compact Monte Carlo method to accurately evaluate the size effect on resistivity in very narrow and thin metallic interconnects. It is shown that our method well reproduces the size effect in very narrow and thin copper wires, and a consideration of the geometric effect on resistivity is significant to accurately estimate the size effect. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | Monte Carlo method / size effect on resistivity / surface scattering / grain boundary scattering / geometric effect / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 109, no. 278, SDM2009-145, pp. 55-60, Nov. 2009. | |
| Paper # | SDM2009-145 | |
| Date of Issue | 2009-11-05 (SDM) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | SDM2009-145 Link to ES Tech. Rep. Archives: SDM2009-145 |
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| Conference Information | |
| Committee | SDM |
| Conference Date | 2009-11-12 - 2009-11-13 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Kikai-Shinko-Kaikan Bldg. |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Process, Device, Circuit Simulation, etc. |
| Paper Information | |
| Registration To | SDM |
| Conference Code | 2009-11-SDM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | A Novel Monte Carlo Simulation to Evaluate the Size Effect of Resistivity for Scaled Metallic Interconnects |
| Sub Title (in English) | |
| Keyword(1) | Monte Carlo method |
| Keyword(2) | size effect on resistivity |
| Keyword(3) | surface scattering |
| Keyword(4) | grain boundary scattering |
| Keyword(5) | geometric effect |
| Keyword(6) | |
| Keyword(7) | |
| Keyword(8) | |
| 1st Author's Name | Takashi Kurusu |
| 1st Author's Affiliation | Device Process Development Center, Corporate Research & Develocpment Center, Toshiba Corporation (Toshiba Corp.) |
| 2nd Author's Name | Makoto Wada |
| 2nd Author's Affiliation | Device Process Development Center, Corporate Research & Develocpment Center, Toshiba Corporation (Toshiba Corp.) |
| 3rd Author's Name | Noriaki Matsunaga |
| 3rd Author's Affiliation | Device Process Development Center, Corporate Research & Develocpment Center, Toshiba Corporation (Toshiba Corp.) |
| 4th Author's Name | Akihiro Kajita |
| 4th Author's Affiliation | Device Process Development Center, Corporate Research & Develocpment Center, Toshiba Corporation (Toshiba Corp.) |
| 5th Author's Name | Hiroyoshi Tanimoto |
| 5th Author's Affiliation | Device Process Development Center, Corporate Research & Develocpment Center, Toshiba Corporation (Toshiba Corp.) |
| 6th Author's Name | Nobutoshi Aoki |
| 6th Author's Affiliation | Device Process Development Center, Corporate Research & Develocpment Center, Toshiba Corporation (Toshiba Corp.) |
| 7th Author's Name | Yoshiaki Toyoshima |
| 7th Author's Affiliation | Device Process Development Center, Corporate Research & Develocpment Center, Toshiba Corporation (Toshiba Corp.) |
| 8th Author's Name | Hideki Shibata |
| 8th Author's Affiliation | Device Process Development Center, Corporate Research & Develocpment Center, Toshiba Corporation (Toshiba Corp.) |
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| Speaker | Author-1 |
| Date Time | 2009-11-13 11:15:00 |
| Presentation Time | 25 minutes |
| Registration for | SDM |
| Paper # | SDM2009-145 |
| Volume (vol) | vol.109 |
| Number (no) | no.278 |
| Page | pp.55-60 |
| #Pages | 6 |
| Date of Issue | 2009-11-05 (SDM) |
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