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Paper Abstract and Keywords
Presentation 2009-08-11 11:40
Epitaxial growth of gallium nitride on Si by hot-mesh CVD method with intermittent gas supplies.
Takeshi Saitou, Kazuki Nagata (Nagaoka Univ. of Tech.), Maki Suemitsu, Tetsuo Endoh (RIEC Tohoku Univ.), Takashi Ito (CIR Tohoku Univ.), Hideki Nakazawa (Hirosaki Univ.), Yuzuru Narita (Yamagata Univ.), Masasuke Takata, Tadashi Akahane, Kanji Yasui (Nagaoka Univ. of Tech.) CPM2009-45 Link to ES Tech. Rep. Archives: CPM2009-45
Abstract (in Japanese) (See Japanese page) 
(in English) Hot-mesh CVD with various gas supply modes for the epitaxial growth of gallium nitride (GaN) on Si was investigated for the improvement of its crystallinity and optical properties. The optimal interruption time in an intermittent TMG gas supply was also investigated. As a result, the good crystallinity of GaN films was obtained by an intermittent gas supply of TMG and a continuous supply of NH3 gas. The best crystallinity was obtained at an interruption time of 8 s.
Keyword (in Japanese) (See Japanese page) 
(in English) GaN / AlN / Intermittent supply / Ru / W-mesh / Hot-mesh CVD / /  
Reference Info. IEICE Tech. Rep., vol. 109, no. 171, CPM2009-45, pp. 61-66, Aug. 2009.
Paper # CPM2009-45 
Date of Issue 2009-08-03 (CPM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF CPM2009-45 Link to ES Tech. Rep. Archives: CPM2009-45

Conference Information
Committee CPM  
Conference Date 2009-08-10 - 2009-08-11 
Place (in Japanese) (See Japanese page) 
Place (in English) Hirosaki Univ. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Electronic Component Parts and Materials, etc. 
Paper Information
Registration To CPM 
Conference Code 2009-08-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Epitaxial growth of gallium nitride on Si by hot-mesh CVD method with intermittent gas supplies. 
Sub Title (in English)  
Keyword(1) GaN  
Keyword(2) AlN  
Keyword(3) Intermittent supply  
Keyword(4) Ru  
Keyword(5) W-mesh  
Keyword(6) Hot-mesh CVD  
Keyword(7)  
Keyword(8)  
1st Author's Name Takeshi Saitou  
1st Author's Affiliation Nagaoka University of Technology (Nagaoka Univ. of Tech.)
2nd Author's Name Kazuki Nagata  
2nd Author's Affiliation Nagaoka University of Technology (Nagaoka Univ. of Tech.)
3rd Author's Name Maki Suemitsu  
3rd Author's Affiliation Research Institute of Electrical Communication, Tohoku University (RIEC Tohoku Univ.)
4th Author's Name Tetsuo Endoh  
4th Author's Affiliation Research Institute of Electrical Communication, Tohoku University (RIEC Tohoku Univ.)
5th Author's Name Takashi Ito  
5th Author's Affiliation Center of Interdisciplinary Research, Tohoku University (CIR Tohoku Univ.)
6th Author's Name Hideki Nakazawa  
6th Author's Affiliation Faculty of Science & Technology, Hirosaki University (Hirosaki Univ.)
7th Author's Name Yuzuru Narita  
7th Author's Affiliation Yamagata University (Yamagata Univ.)
8th Author's Name Masasuke Takata  
8th Author's Affiliation Nagaoka University of Technology (Nagaoka Univ. of Tech.)
9th Author's Name Tadashi Akahane  
9th Author's Affiliation Nagaoka University of Technology (Nagaoka Univ. of Tech.)
10th Author's Name Kanji Yasui  
10th Author's Affiliation Nagaoka University of Technology (Nagaoka Univ. of Tech.)
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Speaker Author-10 
Date Time 2009-08-11 11:40:00 
Presentation Time 25 minutes 
Registration for CPM 
Paper # CPM2009-45 
Volume (vol) vol.109 
Number (no) no.171 
Page pp.61-66 
#Pages
Date of Issue 2009-08-03 (CPM) 


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