Paper Abstract and Keywords |
Presentation |
2009-08-11 11:40
Epitaxial growth of gallium nitride on Si by hot-mesh CVD method with intermittent gas supplies. Takeshi Saitou, Kazuki Nagata (Nagaoka Univ. of Tech.), Maki Suemitsu, Tetsuo Endoh (RIEC Tohoku Univ.), Takashi Ito (CIR Tohoku Univ.), Hideki Nakazawa (Hirosaki Univ.), Yuzuru Narita (Yamagata Univ.), Masasuke Takata, Tadashi Akahane, Kanji Yasui (Nagaoka Univ. of Tech.) CPM2009-45 Link to ES Tech. Rep. Archives: CPM2009-45 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Hot-mesh CVD with various gas supply modes for the epitaxial growth of gallium nitride (GaN) on Si was investigated for the improvement of its crystallinity and optical properties. The optimal interruption time in an intermittent TMG gas supply was also investigated. As a result, the good crystallinity of GaN films was obtained by an intermittent gas supply of TMG and a continuous supply of NH3 gas. The best crystallinity was obtained at an interruption time of 8 s. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
GaN / AlN / Intermittent supply / Ru / W-mesh / Hot-mesh CVD / / |
Reference Info. |
IEICE Tech. Rep., vol. 109, no. 171, CPM2009-45, pp. 61-66, Aug. 2009. |
Paper # |
CPM2009-45 |
Date of Issue |
2009-08-03 (CPM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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CPM2009-45 Link to ES Tech. Rep. Archives: CPM2009-45 |
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