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Paper Abstract and Keywords
Presentation 2009-08-10 15:05
Evaluation of Hydrogen Desorption Barrier from Si(100) Surface using Temperature-Pprogrammed Desorption and Isothermal Desorption
Yuzuru Narita (Yamagata Univ.), Goro Yasutomi, Chie Unoko, Shoji Inanaga, Akira Namiki (Kyushu Inst. of Tech.) CPM2009-34 Link to ES Tech. Rep. Archives: CPM2009-34
Abstract (in Japanese) (See Japanese page) 
(in English) We have investigated desorption kinetics of deutrium from a Si(100) surface
using temperature-programmed desorption (TPD) and isothermal
desorption methods.
From semi-logarithmic plots of TPD spectra, it is found that three desorption components, denoted as $\beta_{1,\rm{A}}$, $\beta_{1,\rm{B}}$, and C, can be distinguished.
The maximum of the $\beta_{1,\rm{A}}$ peak is nearly constant at around the maximum temperature of the TPD peak.
On the orther hand, the $\beta_{1,\rm{B}}$ peak systematically shifts to higher temperatures with decreasing $\theta_{\rm D}^{0}$.
These results imply that first- and second-order kinetics are operating for the $\beta_{1,\rm{A}}$ and $\beta_{1,\rm{B}}$ desorptions, respectively.
From the analysis of isothermal desorption curves, the desorption barriers for the $\beta_{1,\rm{A}}$ and $\beta_{1,\rm{B}}$ desorptions are evaluated to be 1.6$\pm$0.1 eV and 1.8$\pm$0.1 eV, respectively. These values are substantially lower than the widely accepted value of 2.5 eV.
The desorption mechanisms for the $\beta_{1,\rm{A}}$, $\beta_{1,\rm{B}}$ and C channels are discussed based on an inter-dimer model.
Keyword (in Japanese) (See Japanese page) 
(in English) Hydrogen / Si(100) surface / Temperature-programmed desorption / Isothermal desorption / Desorption barrier / / /  
Reference Info. IEICE Tech. Rep., vol. 109, no. 171, CPM2009-34, pp. 5-8, Aug. 2009.
Paper # CPM2009-34 
Date of Issue 2009-08-03 (CPM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF CPM2009-34 Link to ES Tech. Rep. Archives: CPM2009-34

Conference Information
Committee CPM  
Conference Date 2009-08-10 - 2009-08-11 
Place (in Japanese) (See Japanese page) 
Place (in English) Hirosaki Univ. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Electronic Component Parts and Materials, etc. 
Paper Information
Registration To CPM 
Conference Code 2009-08-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Evaluation of Hydrogen Desorption Barrier from Si(100) Surface using Temperature-Pprogrammed Desorption and Isothermal Desorption 
Sub Title (in English)  
Keyword(1) Hydrogen  
Keyword(2) Si(100) surface  
Keyword(3) Temperature-programmed desorption  
Keyword(4) Isothermal desorption  
Keyword(5) Desorption barrier  
Keyword(6)  
Keyword(7)  
Keyword(8)  
1st Author's Name Yuzuru Narita  
1st Author's Affiliation Yamagata University (Yamagata Univ.)
2nd Author's Name Goro Yasutomi  
2nd Author's Affiliation Kyushu Institute of Technology (Kyushu Inst. of Tech.)
3rd Author's Name Chie Unoko  
3rd Author's Affiliation Kyushu Institute of Technology (Kyushu Inst. of Tech.)
4th Author's Name Shoji Inanaga  
4th Author's Affiliation Kyushu Institute of Technology (Kyushu Inst. of Tech.)
5th Author's Name Akira Namiki  
5th Author's Affiliation Kyushu Institute of Technology (Kyushu Inst. of Tech.)
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Speaker Author-1 
Date Time 2009-08-10 15:05:00 
Presentation Time 25 minutes 
Registration for CPM 
Paper # CPM2009-34 
Volume (vol) vol.109 
Number (no) no.171 
Page pp.5-8 
#Pages
Date of Issue 2009-08-03 (CPM) 


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