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| Presentation | 2009-07-31 13:45 Development of wide range micro vacuum sensor with TaAl-N thin film Yukiko Okano, Shuichi Tajiri, Takashi Aozono (Okanoworks), Akio Okamoto (TRI), Soichi Ogawa (Ogawa Creation Research Laboratory), Hiroshi Mima (Osaka City Univ.)  ED2009-114 Link to ES Tech. Rep. Archives: ED2009-114 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | The temperature dependence of the electrical resistivity of TaAl-N thin film was investigated and the characteristics of the thin film was applied to measure a pressure over a wide range in vacuum. The thin films, having been prepared by reacted DC magnetron sputtering method and deposited on the polyimide sheet, have characteristics that make them suitable for using as the thermo-conductive vacuum sensor; a large effective sensing area, a small heat capacity, and a large temperature coefficient of the resistivity (TCR) compared to a metal wire. The thin films was found sensitive to pressure change in the range of 100kPa to 10-4 Pa. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | Reactive sputtering method / TaAl-N thin films / Micro vacuum sensor / / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 109, no. 157, ED2009-114, pp. 63-67, July 2009. | |
| Paper # | ED2009-114 | |
| Date of Issue | 2009-07-23 (ED) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | ED2009-114 Link to ES Tech. Rep. Archives: ED2009-114 |
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| Conference Information | |
| Committee | ED |
| Conference Date | 2009-07-30 - 2009-07-31 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Osaka Univ. Icho-Kaikan |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Paper Information | |
| Registration To | ED |
| Conference Code | 2009-07-ED |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Development of wide range micro vacuum sensor with TaAl-N thin film |
| Sub Title (in English) | |
| Keyword(1) | Reactive sputtering method |
| Keyword(2) | TaAl-N thin films |
| Keyword(3) | Micro vacuum sensor |
| Keyword(4) | |
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| Keyword(8) | |
| 1st Author's Name | Yukiko Okano |
| 1st Author's Affiliation | OKANO WORKS, LTD. (Okanoworks) |
| 2nd Author's Name | Shuichi Tajiri |
| 2nd Author's Affiliation | OKANO WORKS, LTD. (Okanoworks) |
| 3rd Author's Name | Takashi Aozono |
| 3rd Author's Affiliation | OKANO WORKS, LTD. (Okanoworks) |
| 4th Author's Name | Akio Okamoto |
| 4th Author's Affiliation | Technology Research Institute of Osaka Prefecture (TRI) |
| 5th Author's Name | Soichi Ogawa |
| 5th Author's Affiliation | Ogawa Creation Research Laboratory (Ogawa Creation Research Laboratory) |
| 6th Author's Name | Hiroshi Mima |
| 6th Author's Affiliation | Osaka City University (Osaka City Univ.) |
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| Speaker | Author-1 |
| Date Time | 2009-07-31 13:45:00 |
| Presentation Time | 25 minutes |
| Registration for | ED |
| Paper # | ED2009-114 |
| Volume (vol) | vol.109 |
| Number (no) | no.157 |
| Page | pp.63-67 |
| #Pages | 5 |
| Date of Issue | 2009-07-23 (ED) |
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