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| Presentation | 2009-07-16 15:20 Etching damage analysis of patterned media using the Grazing Incidence X-ray Reflectively technique Satoshi Shirotori, Yoshiyuki Kamata, Tomoyuki Maeda, Kazuto Kashiwagi, Yosuke Isowaki, Akira Kikitsu (Toshiba Corp.)  MR2009-17 Link to ES Tech. Rep. Archives: MR2009-17 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | A Co/Pt patterned medium was fabricated by an Ar ion etching process through a self-assembled polymer mask with a diameter of 40 nm, and its etching damage was investigated by using the grazing incidence x-ray reflectivity (GIXR) technique. This method is effective for investigating the changes in the morphology of surface and interface. It was found that the surface roughness was increased from 0.5 nm to 3.8 nm by the etching process, while the roughness of the multilayer structure was not changed. Large roughness at the surface is due to the lack of a dot structure as a result of the over-etching condition. The lack of significant damage to the internal multilayer structure is consistent with the lack of significant degradation in the magnetic characteristics. Ar ion etching is found to be robust for fabricating patterned medium with little damage even in the over-etching condition. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | Magnetic recording / Patterned media / Etching / Grazing Incidence X-ray Reflectively technique / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 109, July 2009. | |
| Paper # | ||
| Date of Issue | 2009-07-09 (MR) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | MR2009-17 Link to ES Tech. Rep. Archives: MR2009-17 |
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| Conference Information | |
| Committee | MRIS ITE-MMS |
| Conference Date | 2009-07-16 - 2009-07-16 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Tokyo Inst. of Tech. |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Paper Information | |
| Registration To | MRIS |
| Conference Code | 2009-07-MMS-MR |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Etching damage analysis of patterned media using the Grazing Incidence X-ray Reflectively technique |
| Sub Title (in English) | |
| Keyword(1) | Magnetic recording |
| Keyword(2) | Patterned media |
| Keyword(3) | Etching |
| Keyword(4) | Grazing Incidence X-ray Reflectively technique |
| Keyword(5) | |
| Keyword(6) | |
| Keyword(7) | |
| Keyword(8) | |
| 1st Author's Name | Satoshi Shirotori |
| 1st Author's Affiliation | Toshiba Corporation (Toshiba Corp.) |
| 2nd Author's Name | Yoshiyuki Kamata |
| 2nd Author's Affiliation | Toshiba Corporation (Toshiba Corp.) |
| 3rd Author's Name | Tomoyuki Maeda |
| 3rd Author's Affiliation | Toshiba Corporation (Toshiba Corp.) |
| 4th Author's Name | Kazuto Kashiwagi |
| 4th Author's Affiliation | Toshiba Corporation (Toshiba Corp.) |
| 5th Author's Name | Yosuke Isowaki |
| 5th Author's Affiliation | Toshiba Corporation (Toshiba Corp.) |
| 6th Author's Name | Akira Kikitsu |
| 6th Author's Affiliation | Toshiba Corporation (Toshiba Corp.) |
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| Speaker | Author-1 |
| Date Time | 2009-07-16 15:20:00 |
| Presentation Time | 25 minutes |
| Registration for | MRIS |
| Paper # | MR2009-17 |
| Volume (vol) | vol.109 |
| Number (no) | no.132 |
| Page | pp.25-30 |
| #Pages | 6 |
| Date of Issue | 2009-07-09 (MR) |
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