Paper Abstract and Keywords |
Presentation |
2009-06-25 13:15
Effect of Ion-Beam-Induced Damage on Luminescence Properties in Tb-Implanted AlxGa1-xN Ji-Ho Park, Hiroshi Okada, Akihiro Wakahara, Yuzo Furukawa (Toyohashi Univ. of Tech.), Yong-Tae Kim (Dankook Univ.), Jonghan Song (KIST), Ho-Jung Chang (Dankook Univ.), Shin-ichiro Sato, Takeshi Ohshima (JAEA, Takasaki) ED2009-82 SDM2009-77 Link to ES Tech. Rep. Archives: ED2009-82 SDM2009-77 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
We investigated the effect of ion-beam-induced damage on luminescence properties for rare earth ions -doped III-nitride semiconductor. Tb ions were implanted into Al0.35Ga0.65N epi-layers grown by OMVPE, and the dose were in the range of 1×1012 ~ 2.8×1016 Tb/cm2. RBS/C reveals that ion-beam-induced damage level steeply increases when the dose exceed 5×1014 Tb/cm2. Tb-related luminescence properties are much susceptible to defect, because CL intensity begins to saturate even at low dose (1×1013 Tb/cm2) at which expected defect density is very low. Transient decay time became faster as increases Tb ions dose above 1×1013 Tb/cm2. The results suggest that non-radiative defects, perhaps Tb-defect complexes, are formed in low dose condition even though the structural defect density is very low. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Rare Earth / Terbium / AlGaN / Ion-Beam-Damage / III-nitride semiconductor / MOCVD / / |
Reference Info. |
IEICE Tech. Rep., vol. 109, no. 97, ED2009-82, pp. 141-144, June 2009. |
Paper # |
ED2009-82 |
Date of Issue |
2009-06-17 (ED, SDM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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ED2009-82 SDM2009-77 Link to ES Tech. Rep. Archives: ED2009-82 SDM2009-77 |
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