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Paper Abstract and Keywords
Presentation 2009-06-19 09:05
Theoretical Study on Fabrication Tolerance of Five-Layer Asymmetric Coupled Quantum Well
Yuji Iseri, Taro Arakawa (Yokohama National Univ.), Kunio Tada (Kanazawa Inst. of Tech.), Nobuo Haneji (Yokohama National Univ.) OPE2009-16 LQE2009-19 Link to ES Tech. Rep. Archives: OPE2009-16 LQE2009-19
Abstract (in Japanese) (See Japanese page) 
(in English) For evaluating fabrication tolerance of an InGaAs/InAlAs five-layer asymmetric coupled quantum well (FACQW), influence of abruptness of heterointerfaces in the FACQW on its electrorefractive effect was theoretically studied . In the analysis, it is assumed that composition profile in a heterointerface is exponential, and a thickness of a transition layer L is defined. We investigated the change in electrorefractive index of the FACQW with various L. With the increase of L, electrorefractive index change remarkably decreases especially in the case of $L \ge 3$ ML. In addition, we propose an improved FACQW structure which is expected to exhibit large electrorefractive index even in the case of L=3 ML.
Keyword (in Japanese) (See Japanese page) 
(in English) Quantum Well / Five-Layer Asymmetric Coupled Quantum Well / InGaAs / Heterointerface Abruptness / Electrorefractive effect / / /  
Reference Info. IEICE Tech. Rep., vol. 109, no. 93, LQE2009-19, pp. 1-6, June 2009.
Paper # LQE2009-19 
Date of Issue 2009-06-12 (OPE, LQE) 
ISSN Print edition: ISSN 0913-5685  Online edition: ISSN 2432-6380
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (No. 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF OPE2009-16 LQE2009-19 Link to ES Tech. Rep. Archives: OPE2009-16 LQE2009-19

Conference Information
Committee LQE OPE  
Conference Date 2009-06-19 - 2009-06-19 
Place (in Japanese) (See Japanese page) 
Place (in English) Kikai-Shinko-Kaikan Bldg. 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To LQE 
Conference Code 2009-06-LQE-OPE 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Theoretical Study on Fabrication Tolerance of Five-Layer Asymmetric Coupled Quantum Well 
Sub Title (in English)  
Keyword(1) Quantum Well  
Keyword(2) Five-Layer Asymmetric Coupled Quantum Well  
Keyword(3) InGaAs  
Keyword(4) Heterointerface Abruptness  
Keyword(5) Electrorefractive effect  
1st Author's Name Yuji Iseri  
1st Author's Affiliation Yokohama National University (Yokohama National Univ.)
2nd Author's Name Taro Arakawa  
2nd Author's Affiliation Yokohama National University (Yokohama National Univ.)
3rd Author's Name Kunio Tada  
3rd Author's Affiliation Kanazawa Institute of Technology (Kanazawa Inst. of Tech.)
4th Author's Name Nobuo Haneji  
4th Author's Affiliation Yokohama National University (Yokohama National Univ.)
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Date Time 2009-06-19 09:05:00 
Presentation Time 25 
Registration for LQE 
Paper # IEICE-OPE2009-16,IEICE-LQE2009-19 
Volume (vol) IEICE-109 
Number (no) no.92(OPE), no.93(LQE) 
Page pp.1-6 
#Pages IEICE-6 
Date of Issue IEICE-OPE-2009-06-12,IEICE-LQE-2009-06-12 

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