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| Presentation | 2009-01-30 14:00 Improvement of Filtering Characteristics of Bragg Grating Formed on Silicon Waveguide by Deep-RIE Etching Junya Matsui, Hiroki Takahashi, Nan Xie, Katsuyuki Utaka (Waseda Univ.)  PN2008-69 OPE2008-172 LQE2008-169 Link to ES Tech. Rep. Archives: OPE2008-172 LQE2008-169 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | With the increase of communication capacity by WDM, low-cost and high-performance optical devices using Si waveguide on silicon-on-insulator (SOI) substrates attract attention. So far we fabricated the Michelson Interferometer-type filter which works as a WDM interleaver consisting of large coupling-coefficient Si grating made by Deep-RIE. In this paper, we report the improvement of grating characteristics, such as a large transmission contrast of about 25dB and a band width of about 6nm for the grating by deep grating with reduced roughness. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | WDM / SOI / Silicon Bragg Grating / Filter Device / Deep-RIE / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 108, no. 418, OPE2008-172, pp. 151-154, Jan. 2009. | |
| Paper # | OPE2008-172 | |
| Date of Issue | 2009-01-22 (PN, OPE, LQE) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | PN2008-69 OPE2008-172 LQE2008-169 Link to ES Tech. Rep. Archives: OPE2008-172 LQE2008-169 |
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| Conference Information | |
| Committee | PN OPE EMT LQE |
| Conference Date | 2009-01-29 - 2009-01-30 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Kyoto Institute Technology (Matsugasaki Campus) |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Paper Information | |
| Registration To | OPE |
| Conference Code | 2009-01-PN-OPE-EMT-LQE |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Improvement of Filtering Characteristics of Bragg Grating Formed on Silicon Waveguide by Deep-RIE Etching |
| Sub Title (in English) | |
| Keyword(1) | WDM |
| Keyword(2) | SOI |
| Keyword(3) | Silicon Bragg Grating |
| Keyword(4) | Filter Device |
| Keyword(5) | Deep-RIE |
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| Keyword(8) | |
| 1st Author's Name | Junya Matsui |
| 1st Author's Affiliation | Waseda University (Waseda Univ.) |
| 2nd Author's Name | Hiroki Takahashi |
| 2nd Author's Affiliation | Waseda University (Waseda Univ.) |
| 3rd Author's Name | Nan Xie |
| 3rd Author's Affiliation | Waseda University (Waseda Univ.) |
| 4th Author's Name | Katsuyuki Utaka |
| 4th Author's Affiliation | Waseda University (Waseda Univ.) |
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| Speaker | Author-1 |
| Date Time | 2009-01-30 14:00:00 |
| Presentation Time | 25 minutes |
| Registration for | OPE |
| Paper # | PN2008-69, OPE2008-172, LQE2008-169 |
| Volume (vol) | vol.108 |
| Number (no) | no.417(PN), no.418(OPE), no.419(LQE) |
| Page | pp.151-154 |
| #Pages | 4 |
| Date of Issue | 2009-01-22 (PN, OPE, LQE) |
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