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Paper Abstract and Keywords
Presentation 2009-01-29 08:30
Fabrication of Blazed Grating by Using Phase-Shifting Mask
Hideyuki Awazu (Kyoto Inst. Technol.), Kenji Kintaka (AIST), Kenzo Nishio, Yasuhiro Awatsuji, Shogo Ura (Kyoto Inst. Technol.), Junji Nishii (AIST) PN2008-42 OPE2008-145 LQE2008-142 Link to ES Tech. Rep. Archives: OPE2008-145 LQE2008-142
Abstract (in Japanese) (See Japanese page) 
(in English) A new simple interference exposure method using a phase-shifting mask was discussed on the basis of Fourier synthesis for fabricating blazed gratings. The phase-shifting mask consists of a periodic relief pattern and provides a required phase shift. The phase shifting was designed with 244nm exposure-light wavelength to launch multiple diffraction beams so that the resultant interference pattern formed a 3-$\mu$m-period sawtooth optical-intensity profile. A photoresist was coated on a $SiO_{2}$ substrate. A relief of 65nm height was patterned on the $SiO_{2}$ substrate by electron-beam direct writing lithography. A plane wave was illuminated from the rear side of the phase-shifting mask and a sawtooth-like optical intensity profile was observed after 15$\mu$m propagation. A UV-photoresist layer coated on a substrate was exposed by the sawtooth-like intensity pattern and developed.
Keyword (in Japanese) (See Japanese page) 
(in English) Phase-Shifting Mask / Blazed Gratings / Microfabrication Technique / Diffraction Optical Element / Interference Exposure / Near-Field Photolithography / /  
Reference Info. IEICE Tech. Rep., vol. 108, no. 419, LQE2008-142, pp. 1-6, Jan. 2009.
Paper # LQE2008-142 
Date of Issue 2009-01-22 (PN, OPE, LQE) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF PN2008-42 OPE2008-145 LQE2008-142 Link to ES Tech. Rep. Archives: OPE2008-145 LQE2008-142

Conference Information
Committee PN OPE EMT LQE  
Conference Date 2009-01-29 - 2009-01-30 
Place (in Japanese) (See Japanese page) 
Place (in English) Kyoto Institute Technology (Matsugasaki Campus) 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To LQE 
Conference Code 2009-01-PN-OPE-EMT-LQE 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Fabrication of Blazed Grating by Using Phase-Shifting Mask 
Sub Title (in English)  
Keyword(1) Phase-Shifting Mask  
Keyword(2) Blazed Gratings  
Keyword(3) Microfabrication Technique  
Keyword(4) Diffraction Optical Element  
Keyword(5) Interference Exposure  
Keyword(6) Near-Field Photolithography  
Keyword(7)  
Keyword(8)  
1st Author's Name Hideyuki Awazu  
1st Author's Affiliation Kyoto Institute of Technology (Kyoto Inst. Technol.)
2nd Author's Name Kenji Kintaka  
2nd Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
3rd Author's Name Kenzo Nishio  
3rd Author's Affiliation Kyoto Institute of Technology (Kyoto Inst. Technol.)
4th Author's Name Yasuhiro Awatsuji  
4th Author's Affiliation Kyoto Institute of Technology (Kyoto Inst. Technol.)
5th Author's Name Shogo Ura  
5th Author's Affiliation Kyoto Institute of Technology (Kyoto Inst. Technol.)
6th Author's Name Junji Nishii  
6th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
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Speaker Author-1 
Date Time 2009-01-29 08:30:00 
Presentation Time 25 minutes 
Registration for LQE 
Paper # PN2008-42, OPE2008-145, LQE2008-142 
Volume (vol) vol.108 
Number (no) no.417(PN), no.418(OPE), no.419(LQE) 
Page pp.1-6 
#Pages
Date of Issue 2009-01-22 (PN, OPE, LQE) 


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