IEICE Technical Committee Submission System
Conference Paper's Information
Online Proceedings
[Sign in]
Tech. Rep. Archives
 Go Top Page Go Previous   [Japanese] / [English] 

Paper Abstract and Keywords
Presentation 2008-11-16 09:00
Prediction of resistance of electric contact with plated layer (1) -- Theoretical analyses --
Shigeru Sawada, Kaori Shimizu, Yasuhiro Hattori (AutoNetworks Technologies, Ltd.), Terutaka Tamai (Mie Univ.) EMD2008-88 Link to ES Tech. Rep. Archives: EMD2008-88
Abstract (in Japanese) (See Japanese page) 
(in English) Electrical contacts are an important part of electrical circuits and many reliability problems are related to their failure. It is important to investigate relationship between load and contact resistance which made contact reliability. In this study, the effect of plating material and plating thickness on contact resistance was examined. The samples were constructed of a copper alloy with tin or silver plating. The resistance of the embossment shape and plane contact was measured by using a four-probe method with a load up to 40N. The relation between contact area and contact resistance is determined. As experimental result, the results show that the contact resistance depends on the indentation of the contact area. At in the same contact area, tin-plated samples have higher resistance than those that are silver-plated because of their own resistivity. The constriction resistance with a plating layer, which depends on contact area and plating thickness, is calculated by electrical field analysis in order to predict load-contact resistance. The constriction resistance with plating is shown by R=Φρ/2a, using a surface resistance coefficient Φ theoretically. The theoretical results show good agreement with experimental results in the case of silver plating. In the case of tin plating, the experimental results are slightly higher than the theoretical results due to tin oxide film resistance effects.
Keyword (in Japanese) (See Japanese page) 
(in English) Electrical contact / contact resistance / plating / contact load / contact area / / /  
Reference Info. IEICE Tech. Rep., vol. 108, no. 296, EMD2008-88, pp. 93-96, Nov. 2008.
Paper # EMD2008-88 
Date of Issue 2008-11-08 (EMD) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF EMD2008-88 Link to ES Tech. Rep. Archives: EMD2008-88

Conference Information
Committee EMD  
Conference Date 2008-11-15 - 2008-11-16 
Place (in Japanese) (See Japanese page) 
Place (in English) Tohoku Bunka Gakuin University (Sendai) 
Topics (in Japanese) (See Japanese page) 
Topics (in English) International Session on Electro-Mechanical Devices 2008 
Paper Information
Registration To EMD 
Conference Code 2008-11-EMD 
Language English (Japanese title is available) 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Prediction of resistance of electric contact with plated layer (1) 
Sub Title (in English) Theoretical analyses 
Keyword(1) Electrical contact  
Keyword(2) contact resistance  
Keyword(3) plating  
Keyword(4) contact load  
Keyword(5) contact area  
Keyword(6)  
Keyword(7)  
Keyword(8)  
1st Author's Name Shigeru Sawada  
1st Author's Affiliation AutoNetworks Technologies, Ltd. (AutoNetworks Technologies, Ltd.)
2nd Author's Name Kaori Shimizu  
2nd Author's Affiliation AutoNetworks Technologies, Ltd. (AutoNetworks Technologies, Ltd.)
3rd Author's Name Yasuhiro Hattori  
3rd Author's Affiliation AutoNetworks Technologies, Ltd. (AutoNetworks Technologies, Ltd.)
4th Author's Name Terutaka Tamai  
4th Author's Affiliation Mie University (Mie Univ.)
5th Author's Name  
5th Author's Affiliation ()
6th Author's Name  
6th Author's Affiliation ()
7th Author's Name  
7th Author's Affiliation ()
8th Author's Name  
8th Author's Affiliation ()
9th Author's Name  
9th Author's Affiliation ()
10th Author's Name  
10th Author's Affiliation ()
11th Author's Name  
11th Author's Affiliation ()
12th Author's Name  
12th Author's Affiliation ()
13th Author's Name  
13th Author's Affiliation ()
14th Author's Name  
14th Author's Affiliation ()
15th Author's Name  
15th Author's Affiliation ()
16th Author's Name  
16th Author's Affiliation ()
17th Author's Name  
17th Author's Affiliation ()
18th Author's Name  
18th Author's Affiliation ()
19th Author's Name  
19th Author's Affiliation ()
20th Author's Name  
20th Author's Affiliation ()
Speaker Author-1 
Date Time 2008-11-16 09:00:00 
Presentation Time 20 minutes 
Registration for EMD 
Paper # EMD2008-88 
Volume (vol) vol.108 
Number (no) no.296 
Page pp.93-96 
#Pages
Date of Issue 2008-11-08 (EMD) 


[Return to Top Page]

[Return to IEICE Web Page]


The Institute of Electronics, Information and Communication Engineers (IEICE), Japan