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Paper Abstract and Keywords
Presentation 2008-10-31 11:45
Structure and photocatalytic properties of TiO2 films depopsited by high rate reactive sputtering.
Yoichi Hoshi, Taiki Ishihara, Tetsuya Sakai, Hao Lei (Tokyo Polytechnio Univ.), Hidehiko Shimizu (Niigata Univ.) CPM2008-88 Link to ES Tech. Rep. Archives: CPM2008-88
Abstract (in Japanese) (See Japanese page) 
(in English) We reported that reactive sputtering by using two sputtering sources, one for the supply of Ti atoms and another for the supply of oxygen radicals was useful for the deposition of TiO2 films at high rate above 20nm/min. In this work, structure and photocatalytic properties of the TiO2 films deposited by the method were investigated. The film structure could be controlled by controlling the supply ratio RO/RTi of oxygen molecules and titanium atoms to the substrate, and single phase anatase film was obtained at the supply ratio above 280. The films deposited in this study showed super hydrophilicity by the irradiation of ultraviolet rays, although the hydrophilicity were improved by the increase of the anatase phase in the film.
Keyword TiO2,Thin film, reactive sputter, high rate deposition, Photocatalytic film
Keyword (in Japanese) (See Japanese page) 
(in English) TiO2 / Thin film / reactive sputter / high rate deposition / photo-catalytic film / / /  
Reference Info. IEICE Tech. Rep., vol. 108, no. 269, CPM2008-88, pp. 75-79, Oct. 2008.
Paper # CPM2008-88 
Date of Issue 2008-10-23 (CPM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF CPM2008-88 Link to ES Tech. Rep. Archives: CPM2008-88

Conference Information
Committee CPM  
Conference Date 2008-10-30 - 2008-10-31 
Place (in Japanese) (See Japanese page) 
Place (in English) Niigata Univ. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Process of Thin Film formation and Materials, etc. 
Paper Information
Registration To CPM 
Conference Code 2008-10-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Structure and photocatalytic properties of TiO2 films depopsited by high rate reactive sputtering. 
Sub Title (in English)  
Keyword(1) TiO2  
Keyword(2) Thin film  
Keyword(3) reactive sputter  
Keyword(4) high rate deposition  
Keyword(5) photo-catalytic film  
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1st Author's Name Yoichi Hoshi  
1st Author's Affiliation Tokyo Polytechnic University (Tokyo Polytechnio Univ.)
2nd Author's Name Taiki Ishihara  
2nd Author's Affiliation Tokyo Polytechnic University (Tokyo Polytechnio Univ.)
3rd Author's Name Tetsuya Sakai  
3rd Author's Affiliation Tokyo Polytechnic University (Tokyo Polytechnio Univ.)
4th Author's Name Hao Lei  
4th Author's Affiliation Tokyo Polytechnic University (Tokyo Polytechnio Univ.)
5th Author's Name Hidehiko Shimizu  
5th Author's Affiliation Niigata University (Niigata Univ.)
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Speaker Author-1 
Date Time 2008-10-31 11:45:00 
Presentation Time 25 minutes 
Registration for CPM 
Paper # CPM2008-88 
Volume (vol) vol.108 
Number (no) no.269 
Page pp.75-79 
#Pages
Date of Issue 2008-10-23 (CPM) 


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