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| Presentation | 2008-10-30 14:55 Characteristic of AZO Thin Films Deposited by SBD Method Takuya Honma, Kaoru Satou, Takeharu Shimomura, Rijin Syou, Hidehiko Shimizu, Haruo Iwano (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnio Univ.)  CPM2008-79 Link to ES Tech. Rep. Archives: CPM2008-79 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | In order to clarify a problem in sputtering deposition process when zinc oxide films of transparent conductive oxides were deposited by magnetron sputtering (MS) method, we examined properties of AZO films deposited by MS method and sputter-beam deposition (SBD) method. As a result, the films of inside from position of substrate above the erosion deposited by MS and SBD method had bad crystallinity whereas the films of outside from position of substrate above the erosion deposited by MS and SBD method had good crystallinity. The composition of the film in a inplane direction was different by a depositon method and sputtering gas pressure. It was thought that the change in the resistivity in the film was related to crystalline in the film. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | ZnO thin films / resistivity / Sputter-Beam Deposition Method / Erosion / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 108, no. 269, CPM2008-79, pp. 23-28, Oct. 2008. | |
| Paper # | CPM2008-79 | |
| Date of Issue | 2008-10-23 (CPM) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | CPM2008-79 Link to ES Tech. Rep. Archives: CPM2008-79 |
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| Conference Information | |
| Committee | CPM |
| Conference Date | 2008-10-30 - 2008-10-31 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Niigata Univ. |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Process of Thin Film formation and Materials, etc. |
| Paper Information | |
| Registration To | CPM |
| Conference Code | 2008-10-CPM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Characteristic of AZO Thin Films Deposited by SBD Method |
| Sub Title (in English) | |
| Keyword(1) | ZnO thin films |
| Keyword(2) | resistivity |
| Keyword(3) | Sputter-Beam Deposition Method |
| Keyword(4) | Erosion |
| Keyword(5) | |
| Keyword(6) | |
| Keyword(7) | |
| Keyword(8) | |
| 1st Author's Name | Takuya Honma |
| 1st Author's Affiliation | Niigata University (Niigata Univ.) |
| 2nd Author's Name | Kaoru Satou |
| 2nd Author's Affiliation | Niigata University (Niigata Univ.) |
| 3rd Author's Name | Takeharu Shimomura |
| 3rd Author's Affiliation | Niigata University (Niigata Univ.) |
| 4th Author's Name | Rijin Syou |
| 4th Author's Affiliation | Niigata University (Niigata Univ.) |
| 5th Author's Name | Hidehiko Shimizu |
| 5th Author's Affiliation | Niigata University (Niigata Univ.) |
| 6th Author's Name | Haruo Iwano |
| 6th Author's Affiliation | Niigata University (Niigata Univ.) |
| 7th Author's Name | Yoichi Hoshi |
| 7th Author's Affiliation | Tokyo Polytechnio University (Tokyo Polytechnio Univ.) |
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| Speaker | Author-1 |
| Date Time | 2008-10-30 14:55:00 |
| Presentation Time | 25 minutes |
| Registration for | CPM |
| Paper # | CPM2008-79 |
| Volume (vol) | vol.108 |
| Number (no) | no.269 |
| Page | pp.23-28 |
| #Pages | 6 |
| Date of Issue | 2008-10-23 (CPM) |
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