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Paper Abstract and Keywords
Presentation 2008-10-30 15:20
Preparation of Sputtered Cr2O3 Thin Films Aiming for Magnetoelectric Effect Appearance
Shunnpei Ootsuki, Nobuyuki Iwata, Hiroshi Yamamoto (Nihon Univ.) CPM2008-85 Link to ES Tech. Rep. Archives: CPM2008-85
Abstract (in Japanese) (See Japanese page) 
(in English) The magnetoelectric (ME) effect is defined as the appearance of magnetization induced by applied electric field and vice versa. A Cr2O3 is focused as a representative magnetoelectric material and/or an antiferromagnetic insulator with the Neel temperature of 308K. The Cr2O3 films were prepared from a Cr metal target by a DC-RF hybrid magnetron sputtering method on CeO2//Nb-SrTiO3(100)(Nb-STO). The buffer CeO2 thin films were made with the same sputtering equipment. Cr2O3 thin films were prepared at substrate temperature, 510°C~630°C. The best Full Width Half Maximum, 0.88 degree and the best average roughness (Ra), 3.31 nm was obtained in the film deposited on 600°C substrates and on 560°C substrates, respectively. On the other hand, the isolation voltage of the film was increased up to 0.145 MV/cm in the inferior crystalline film deposited on 510°C substrates with comparatively high Ra.
Keyword (in Japanese) (See Japanese page) 
(in English) magnetoelectric(ME) effect / sputtering / Cr2O3 / CeO2 / Nb-STO / / /  
Reference Info. IEICE Tech. Rep., vol. 108, no. 269, CPM2008-85, pp. 59-64, Oct. 2008.
Paper # CPM2008-85 
Date of Issue 2008-10-23 (CPM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF CPM2008-85 Link to ES Tech. Rep. Archives: CPM2008-85

Conference Information
Committee CPM  
Conference Date 2008-10-30 - 2008-10-31 
Place (in Japanese) (See Japanese page) 
Place (in English) Niigata Univ. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Process of Thin Film formation and Materials, etc. 
Paper Information
Registration To CPM 
Conference Code 2008-10-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Preparation of Sputtered Cr2O3 Thin Films Aiming for Magnetoelectric Effect Appearance 
Sub Title (in English)  
Keyword(1) magnetoelectric(ME) effect  
Keyword(2) sputtering  
Keyword(3) Cr2O3  
Keyword(4) CeO2  
Keyword(5) Nb-STO  
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1st Author's Name Shunnpei Ootsuki  
1st Author's Affiliation Nihon University (Nihon Univ.)
2nd Author's Name Nobuyuki Iwata  
2nd Author's Affiliation Nihon University (Nihon Univ.)
3rd Author's Name Hiroshi Yamamoto  
3rd Author's Affiliation Nihon University (Nihon Univ.)
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Speaker Author-1 
Date Time 2008-10-30 15:20:00 
Presentation Time 25 minutes 
Registration for CPM 
Paper # CPM2008-85 
Volume (vol) vol.108 
Number (no) no.269 
Page pp.59-64 
#Pages
Date of Issue 2008-10-23 (CPM) 


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