Paper Abstract and Keywords |
Presentation |
2008-10-30 15:20
Preparation of Sputtered Cr2O3 Thin Films Aiming for Magnetoelectric Effect Appearance Shunnpei Ootsuki, Nobuyuki Iwata, Hiroshi Yamamoto (Nihon Univ.) CPM2008-85 Link to ES Tech. Rep. Archives: CPM2008-85 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
The magnetoelectric (ME) effect is defined as the appearance of magnetization induced by applied electric field and vice versa. A Cr2O3 is focused as a representative magnetoelectric material and/or an antiferromagnetic insulator with the Neel temperature of 308K. The Cr2O3 films were prepared from a Cr metal target by a DC-RF hybrid magnetron sputtering method on CeO2//Nb-SrTiO3(100)(Nb-STO). The buffer CeO2 thin films were made with the same sputtering equipment. Cr2O3 thin films were prepared at substrate temperature, 510°C~630°C. The best Full Width Half Maximum, 0.88 degree and the best average roughness (Ra), 3.31 nm was obtained in the film deposited on 600°C substrates and on 560°C substrates, respectively. On the other hand, the isolation voltage of the film was increased up to 0.145 MV/cm in the inferior crystalline film deposited on 510°C substrates with comparatively high Ra. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
magnetoelectric(ME) effect / sputtering / Cr2O3 / CeO2 / Nb-STO / / / |
Reference Info. |
IEICE Tech. Rep., vol. 108, no. 269, CPM2008-85, pp. 59-64, Oct. 2008. |
Paper # |
CPM2008-85 |
Date of Issue |
2008-10-23 (CPM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
CPM2008-85 Link to ES Tech. Rep. Archives: CPM2008-85 |
Conference Information |
Committee |
CPM |
Conference Date |
2008-10-30 - 2008-10-31 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Niigata Univ. |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Process of Thin Film formation and Materials, etc. |
Paper Information |
Registration To |
CPM |
Conference Code |
2008-10-CPM |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Preparation of Sputtered Cr2O3 Thin Films Aiming for Magnetoelectric Effect Appearance |
Sub Title (in English) |
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Keyword(1) |
magnetoelectric(ME) effect |
Keyword(2) |
sputtering |
Keyword(3) |
Cr2O3 |
Keyword(4) |
CeO2 |
Keyword(5) |
Nb-STO |
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1st Author's Name |
Shunnpei Ootsuki |
1st Author's Affiliation |
Nihon University (Nihon Univ.) |
2nd Author's Name |
Nobuyuki Iwata |
2nd Author's Affiliation |
Nihon University (Nihon Univ.) |
3rd Author's Name |
Hiroshi Yamamoto |
3rd Author's Affiliation |
Nihon University (Nihon Univ.) |
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Speaker |
Author-1 |
Date Time |
2008-10-30 15:20:00 |
Presentation Time |
25 minutes |
Registration for |
CPM |
Paper # |
CPM2008-85 |
Volume (vol) |
vol.108 |
Number (no) |
no.269 |
Page |
pp.59-64 |
#Pages |
6 |
Date of Issue |
2008-10-23 (CPM) |
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