Paper Abstract and Keywords |
Presentation |
2008-10-17 14:25
Contact Resistance Characteristics of Soft Metals such as Sn, Al, In. Terutaka Tamai, Shigeru Sawada (Mie Univ.), Yasuhiro Hattori (AuoNetworks) EMD2008-62 Link to ES Tech. Rep. Archives: EMD2008-62 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Soft metal group such as Sn, Al and In is widely applied to connections, junctions and contacts. Since surfaces of the metals are usually covered with its oxide films, corrosion resistance property appears. It is difficult to obtain low contact resistance without mechanical break-down of the oxide film. Therefore, contact mechanisms are complex and are not clarified. In the present study, to clarify the contact mechanism of the soft metal group contacts more in detail, the contact resistance characteristics for changes of contact load were measured under lower contact load region. Obtained contact traces in these examinations were observed by optically and SEM. As results, it was found that decrease in the contact resistance strongly depended on a deformation of piling up of a periphery of the contact trace and occurrence of adhesion which can not be explained by the deformation theory eidely accepted. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
S, Al and In soft group contacts / contact resistance / contact load / contact trace / connector / / / |
Reference Info. |
IEICE Tech. Rep., vol. 108, no. 246, EMD2008-62, pp. 13-18, Oct. 2008. |
Paper # |
EMD2008-62 |
Date of Issue |
2008-10-10 (EMD) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
EMD2008-62 Link to ES Tech. Rep. Archives: EMD2008-62 |
Conference Information |
Committee |
EMD |
Conference Date |
2008-10-17 - 2008-10-17 |
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(See Japanese page) |
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Paper Information |
Registration To |
EMD |
Conference Code |
2008-10-EMD |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Contact Resistance Characteristics of Soft Metals such as Sn, Al, In. |
Sub Title (in English) |
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Keyword(1) |
S, Al and In soft group contacts |
Keyword(2) |
contact resistance |
Keyword(3) |
contact load |
Keyword(4) |
contact trace |
Keyword(5) |
connector |
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1st Author's Name |
Terutaka Tamai |
1st Author's Affiliation |
Mie University (Mie Univ.) |
2nd Author's Name |
Shigeru Sawada |
2nd Author's Affiliation |
Mie University (Mie Univ.) |
3rd Author's Name |
Yasuhiro Hattori |
3rd Author's Affiliation |
AutoNetworks Technology, Ltd (AuoNetworks) |
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Speaker |
Author-1 |
Date Time |
2008-10-17 14:25:00 |
Presentation Time |
25 minutes |
Registration for |
EMD |
Paper # |
EMD2008-62 |
Volume (vol) |
vol.108 |
Number (no) |
no.246 |
Page |
pp.13-18 |
#Pages |
6 |
Date of Issue |
2008-10-10 (EMD) |
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