Paper Abstract and Keywords |
Presentation |
2008-08-04 14:50
Preparation of Mg-Ni thin films by Alternation Layer Deposition Method Hidehiko Shimizu, Makoto Hirata, Tomohiro Okada, Haruo Iwano, Takahiro Kawakami (Niigata Univ.) CPM2008-43 Link to ES Tech. Rep. Archives: CPM2008-43 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Mg-Ni films were attempted by alternation layer deposition of Mg film and Ni film using magnetron spattering (MS) and sputter-beam deposition (SBD) method. As a result, The diffraction peak from the Mg(002) plane was observed in the films deposited by MS method, whereas the diffraction peak from the Ni(111) plane was observed in the films deposited by SBD method. When films deposited at room temperature, the interface between the Mg and the Ni of the film deposited by SBD method was clearer than that of the film made by the MS method. The transmittance in the diluted hydrogen atmosphere of the films deposited by MS method was higher than that of the films made by SBD method. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Mg-Ni Film / Alternate Layer Deposition / Switching mirror / Magnetron Spattering Method / putter-Beam Deposition Method / / / |
Reference Info. |
IEICE Tech. Rep., vol. 108, no. 178, CPM2008-43, pp. 9-14, Aug. 2008. |
Paper # |
CPM2008-43 |
Date of Issue |
2008-07-28 (CPM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
CPM2008-43 Link to ES Tech. Rep. Archives: CPM2008-43 |
Conference Information |
Committee |
CPM |
Conference Date |
2008-08-04 - 2008-08-04 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Muroran Institute of Technology |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Electronic Component Parts and Materials, etc. |
Paper Information |
Registration To |
CPM |
Conference Code |
2008-08-CPM |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Preparation of Mg-Ni thin films by Alternation Layer Deposition Method |
Sub Title (in English) |
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Keyword(1) |
Mg-Ni Film |
Keyword(2) |
Alternate Layer Deposition |
Keyword(3) |
Switching mirror |
Keyword(4) |
Magnetron Spattering Method |
Keyword(5) |
putter-Beam Deposition Method |
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1st Author's Name |
Hidehiko Shimizu |
1st Author's Affiliation |
Niigata University (Niigata Univ.) |
2nd Author's Name |
Makoto Hirata |
2nd Author's Affiliation |
Niigata University (Niigata Univ.) |
3rd Author's Name |
Tomohiro Okada |
3rd Author's Affiliation |
Niigata University (Niigata Univ.) |
4th Author's Name |
Haruo Iwano |
4th Author's Affiliation |
Niigata University (Niigata Univ.) |
5th Author's Name |
Takahiro Kawakami |
5th Author's Affiliation |
Niigata University (Niigata Univ.) |
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Speaker |
Author-1 |
Date Time |
2008-08-04 14:50:00 |
Presentation Time |
25 minutes |
Registration for |
CPM |
Paper # |
CPM2008-43 |
Volume (vol) |
vol.108 |
Number (no) |
no.178 |
Page |
pp.9-14 |
#Pages |
6 |
Date of Issue |
2008-07-28 (CPM) |