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Paper Abstract and Keywords
Presentation 2008-08-04 14:50
Preparation of Mg-Ni thin films by Alternation Layer Deposition Method
Hidehiko Shimizu, Makoto Hirata, Tomohiro Okada, Haruo Iwano, Takahiro Kawakami (Niigata Univ.) CPM2008-43 Link to ES Tech. Rep. Archives: CPM2008-43
Abstract (in Japanese) (See Japanese page) 
(in English) Mg-Ni films were attempted by alternation layer deposition of Mg film and Ni film using magnetron spattering (MS) and sputter-beam deposition (SBD) method. As a result, The diffraction peak from the Mg(002) plane was observed in the films deposited by MS method, whereas the diffraction peak from the Ni(111) plane was observed in the films deposited by SBD method. When films deposited at room temperature, the interface between the Mg and the Ni of the film deposited by SBD method was clearer than that of the film made by the MS method. The transmittance in the diluted hydrogen atmosphere of the films deposited by MS method was higher than that of the films made by SBD method.
Keyword (in Japanese) (See Japanese page) 
(in English) Mg-Ni Film / Alternate Layer Deposition / Switching mirror / Magnetron Spattering Method / putter-Beam Deposition Method / / /  
Reference Info. IEICE Tech. Rep., vol. 108, no. 178, CPM2008-43, pp. 9-14, Aug. 2008.
Paper # CPM2008-43 
Date of Issue 2008-07-28 (CPM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF CPM2008-43 Link to ES Tech. Rep. Archives: CPM2008-43

Conference Information
Committee CPM  
Conference Date 2008-08-04 - 2008-08-04 
Place (in Japanese) (See Japanese page) 
Place (in English) Muroran Institute of Technology 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Electronic Component Parts and Materials, etc. 
Paper Information
Registration To CPM 
Conference Code 2008-08-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Preparation of Mg-Ni thin films by Alternation Layer Deposition Method 
Sub Title (in English)  
Keyword(1) Mg-Ni Film  
Keyword(2) Alternate Layer Deposition  
Keyword(3) Switching mirror  
Keyword(4) Magnetron Spattering Method  
Keyword(5) putter-Beam Deposition Method  
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1st Author's Name Hidehiko Shimizu  
1st Author's Affiliation Niigata University (Niigata Univ.)
2nd Author's Name Makoto Hirata  
2nd Author's Affiliation Niigata University (Niigata Univ.)
3rd Author's Name Tomohiro Okada  
3rd Author's Affiliation Niigata University (Niigata Univ.)
4th Author's Name Haruo Iwano  
4th Author's Affiliation Niigata University (Niigata Univ.)
5th Author's Name Takahiro Kawakami  
5th Author's Affiliation Niigata University (Niigata Univ.)
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Speaker Author-1 
Date Time 2008-08-04 14:50:00 
Presentation Time 25 minutes 
Registration for CPM 
Paper # CPM2008-43 
Volume (vol) vol.108 
Number (no) no.178 
Page pp.9-14 
#Pages
Date of Issue 2008-07-28 (CPM) 


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