講演抄録/キーワード |
講演名 |
2008-07-11 15:20
Characterization of Ni/i-AlGaN/GaN Schottky Samples Fabricated after H3PO4-Etching ○Takayuki Sawada・Yuta Kaizuka・Kensuke Takahashi・Kazuaki Imai(Hokkaido Inst. of Tech.) ED2008-107 SDM2008-126 エレソ技報アーカイブへのリンク:ED2008-107 SDM2008-126 |
抄録 |
(和) |
(まだ登録されていません) |
(英) |
Electrical properties of bare i-AlGaN/GaN and Ni/i-AlGaN/GaN Schottky samples with various thickness of the AlGaN layer, prepared by wet-etching in a hot-H3PO4, were systematically investigated by Hall effect, I-V and C-V measurements. For the bare samples, the thinner the AlGaN layer, the lower 2DEG density according to the theoretical curve with a constant surface barrier height. For Schottky samples, both forward and reverse currents increase with decreasing the AlGaN layer, and the behavior can be explained by combined leakage currents due to leaky patches and simple tunneling through the barrier. C-V measurements supported fairly uniform etching of the AlGaN layer. |
キーワード |
(和) |
窒化ガリウム / AlGaN/GaNへテロ構造 / ショットキー / 電気的特性 / ウェットエッチング / / / |
(英) |
GaN / AlGaN/GaN Heterostructure / Schottky / Electrical Property / Wet-Etching / / / |
文献情報 |
信学技報, vol. 108, no. 121, ED2008-107, pp. 351-355, 2008年7月. |
資料番号 |
ED2008-107 |
発行日 |
2008-07-02 (ED, SDM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
著作権に ついて |
技術研究報告に掲載された論文の著作権は電子情報通信学会に帰属します.(許諾番号:10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
PDFダウンロード |
ED2008-107 SDM2008-126 エレソ技報アーカイブへのリンク:ED2008-107 SDM2008-126 |
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