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Paper Abstract and Keywords
Presentation 2007-12-14 14:40
silicon photonic crystal device fabricated using high-aspect ratio dry etching technique
Kazuhiko Hosomi (Hitachi CRL), Hiroji Yamada (OITDA), Shoji Akamatsu (NCRC., Univ. of Tokyo), Misuzu Sagawa (Hitachi CRL), Toshio Katsuyama, Yasuhiko Arakawa (NCRC., Univ. of Tokyo) Link to ES Tech. Rep. Archives: OPE2007-139
Abstract (in Japanese) (See Japanese page) 
(in English) To realize photonic crystal devices with no polarization dependence, we have been developing 1D- and 3D-silicon photonic crystal devices fabricated using high-aspect ratio dry etching technique. We fabricated 1D perfect photonic crystal and measured optical transmission properties. We also demonstrated fundamental function of chemical sensor using micro cavity made of 1D photonic crystal. In addition, we developed 45 degree angled etching technique, which enables fabrication of 3D photonic crystals with conventional semiconductor processes.
Keyword (in Japanese) (See Japanese page) 
(in English) Photonic crystal / High-Aspect Ratio Dry Etching / Micro Cavity / / / / /  
Reference Info. IEICE Tech. Rep., vol. 107, no. 389, OPE2007-139, pp. 21-26, Dec. 2007.
Paper # OPE2007-139 
Date of Issue 2007-12-07 (OPE) 
ISSN Print edition: ISSN 0913-5685  Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF Link to ES Tech. Rep. Archives: OPE2007-139

Conference Information
Committee OPE  
Conference Date 2007-12-14 - 2007-12-14 
Place (in Japanese) (See Japanese page) 
Place (in English) Kikai-Shinko-Kaikan Bldg. 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To OPE 
Conference Code 2007-12-OPE 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) silicon photonic crystal device fabricated using high-aspect ratio dry etching technique 
Sub Title (in English)  
Keyword(1) Photonic crystal  
Keyword(2) High-Aspect Ratio Dry Etching  
Keyword(3) Micro Cavity  
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1st Author's Name Kazuhiko Hosomi  
1st Author's Affiliation Hitachi Ltd., Central Research Laboratory (Hitachi CRL)
2nd Author's Name Hiroji Yamada  
2nd Author's Affiliation Optoelectronic industry and technology development association (OITDA)
3rd Author's Name Shoji Akamatsu  
3rd Author's Affiliation Nanoelectronics Collaborative Research Center, University of Tokyo (NCRC., Univ. of Tokyo)
4th Author's Name Misuzu Sagawa  
4th Author's Affiliation Hitachi Ltd., Central Research Laboratory (Hitachi CRL)
5th Author's Name Toshio Katsuyama  
5th Author's Affiliation Nanoelectronics Collaborative Research Center, University of Tokyo (NCRC., Univ. of Tokyo)
6th Author's Name Yasuhiko Arakawa  
6th Author's Affiliation Nanoelectronics Collaborative Research Center, University of Tokyo (NCRC., Univ. of Tokyo)
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Speaker
Date Time 2007-12-14 14:40:00 
Presentation Time 25 
Registration for OPE 
Paper # IEICE-OPE2007-139 
Volume (vol) IEICE-107 
Number (no) no.389 
Page pp.21-26 
#Pages IEICE-6 
Date of Issue IEICE-OPE-2007-12-07 


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