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| Presentation | 2007-12-14 10:40 Influence of laser-plasma x-ray irradiation on crystallization of a-Si film by excimer laser annealing Yasuyuki Takanashi, Naoto Matsuo, Kazuya Uejukkoku, Akira Heya (Dept.Mat.Sci.&Chem.,Univ.Hyogo), Sho Amano, Shuji Miyamoto, Takayasu Mochizuki (LASTI,Univ.Hyogo)  SDM2007-224 Link to ES Tech. Rep. Archives: SDM2007-224 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | We investigated the crystallization by Laser Plasma Soft-X-ray (LPX) irradiation followed by Excimer Laser Annealing (ELA) at low-energy densities of 40-60 mJ/cm2. The crystalline fraction of poly-Si films prepared at 50 and 60 mJ/cm2 for the LPX followed by the ELA was 75-85 %. The LPX irradiation before ELA decreases the critical energy density for the start of the crystallization. It is indicated experimentally that this phenomenon is not due to a rise in heat by the LPX irradiation. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | soft X-ray / Si / low temperature / crystallization / TFT / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 107, no. 388, SDM2007-224, pp. 9-13, Dec. 2007. | |
| Paper # | SDM2007-224 | |
| Date of Issue | 2007-12-07 (SDM) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | SDM2007-224 Link to ES Tech. Rep. Archives: SDM2007-224 |
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| Conference Information | |
| Committee | SDM |
| Conference Date | 2007-12-14 - 2007-12-14 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Nara Institute Science and Technology |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Silicon related material, process and device |
| Paper Information | |
| Registration To | SDM |
| Conference Code | 2007-12-SDM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Influence of laser-plasma x-ray irradiation on crystallization of a-Si film by excimer laser annealing |
| Sub Title (in English) | |
| Keyword(1) | soft X-ray |
| Keyword(2) | Si |
| Keyword(3) | low temperature |
| Keyword(4) | crystallization |
| Keyword(5) | TFT |
| Keyword(6) | |
| Keyword(7) | |
| Keyword(8) | |
| 1st Author's Name | Yasuyuki Takanashi |
| 1st Author's Affiliation | Dept.Materials Science & Chemistry, University of Hyogo (Dept.Mat.Sci.&Chem.,Univ.Hyogo) |
| 2nd Author's Name | Naoto Matsuo |
| 2nd Author's Affiliation | Dept.Materials Science & Chemistry, University of Hyogo (Dept.Mat.Sci.&Chem.,Univ.Hyogo) |
| 3rd Author's Name | Kazuya Uejukkoku |
| 3rd Author's Affiliation | Dept.Materials Science & Chemistry, University of Hyogo (Dept.Mat.Sci.&Chem.,Univ.Hyogo) |
| 4th Author's Name | Akira Heya |
| 4th Author's Affiliation | Dept.Materials Science & Chemistry, University of Hyogo (Dept.Mat.Sci.&Chem.,Univ.Hyogo) |
| 5th Author's Name | Sho Amano |
| 5th Author's Affiliation | Labolatory of Advanced Science and Technology for Industry (LASTI,Univ.Hyogo) |
| 6th Author's Name | Shuji Miyamoto |
| 6th Author's Affiliation | Labolatory of Advanced Science and Technology for Industry (LASTI,Univ.Hyogo) |
| 7th Author's Name | Takayasu Mochizuki |
| 7th Author's Affiliation | Labolatory of Advanced Science and Technology for Industry (LASTI,Univ.Hyogo) |
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| Speaker | Author-2 |
| Date Time | 2007-12-14 10:40:00 |
| Presentation Time | 20 minutes |
| Registration for | SDM |
| Paper # | SDM2007-224 |
| Volume (vol) | vol.107 |
| Number (no) | no.388 |
| Page | pp.9-13 |
| #Pages | 5 |
| Date of Issue | 2007-12-07 (SDM) |
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