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| Presentation | 2007-11-16 14:05 Effects of gap between optical mask and photopolymer on grating formation. Harumi Tanabe, Hiroshi Ono (Nagaoka Univ. of Tech.), Nobuhiro Kawatsuki (Univ. of Hyogo)  OME2007-62 OPE2007-129 Link to ES Tech. Rep. Archives: OME2007-62 OPE2007-129 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | It is well known that optical diffraction gratings can be fabricated by photochemical reaction and/or material migration in photo-reactive organic material. One of sophisticated methods for grating formation is mask exposure method. Mask exposure method is useful and convenient to fabricate the large-area gratings. Gap length between the optical mask and substrate is one of very important parameters in proximity exposure. In the present study, considering the coherent length of light source, we intensively study the effects of gap between optical mask and photopolymer on grating formation. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | Grating / Photopolymer / Mask exposure method / Gap length / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 107, no. 322, OPE2007-129, pp. 13-17, Nov. 2007. | |
| Paper # | OPE2007-129 | |
| Date of Issue | 2007-11-09 (OME, OPE) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | OME2007-62 OPE2007-129 Link to ES Tech. Rep. Archives: OME2007-62 OPE2007-129 |
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| Conference Information | |
| Committee | OPE OME |
| Conference Date | 2007-11-16 - 2007-11-16 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Kikai-Shinko-Kaikan Bldg. |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Paper Information | |
| Registration To | OPE |
| Conference Code | 2007-11-OPE-OME |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Effects of gap between optical mask and photopolymer on grating formation. |
| Sub Title (in English) | |
| Keyword(1) | Grating |
| Keyword(2) | Photopolymer |
| Keyword(3) | Mask exposure method |
| Keyword(4) | Gap length |
| Keyword(5) | |
| Keyword(6) | |
| Keyword(7) | |
| Keyword(8) | |
| 1st Author's Name | Harumi Tanabe |
| 1st Author's Affiliation | Nagaoka University of Technology (Nagaoka Univ. of Tech.) |
| 2nd Author's Name | Hiroshi Ono |
| 2nd Author's Affiliation | Nagaoka University of Technology (Nagaoka Univ. of Tech.) |
| 3rd Author's Name | Nobuhiro Kawatsuki |
| 3rd Author's Affiliation | University of Hyogo (Univ. of Hyogo) |
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| Speaker | Author-1 |
| Date Time | 2007-11-16 14:05:00 |
| Presentation Time | 25 minutes |
| Registration for | OPE |
| Paper # | OME2007-62, OPE2007-129 |
| Volume (vol) | vol.107 |
| Number (no) | no.321(OME), no.322(OPE) |
| Page | pp.13-17 |
| #Pages | 5 |
| Date of Issue | 2007-11-09 (OME, OPE) |
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