Paper Abstract and Keywords |
Presentation |
2007-08-09 16:35
Characteristics of Mg-Ni thin films deposited by sputtering method Takashi Aikoh, Daisaku Nagahama, Makoto Hirata, Hidehiko Shimizu, Takeo Maruyama, Haruo Iwano, Takahiro Kawakami (Niigata Univ.) CPM2007-43 Link to ES Tech. Rep. Archives: CPM2007-43 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
We formed making Mg-Ni alloy thin films on the heated substrate by alternate deposition of Mg film and Ni film, and examined relation of that microstructure and optical characteristic. As a result, the films had excellent c-axis orientation of articles is caused changing the laminated structure in the substrate temperature of 150℃. Surface roughness (Ra) and resistivity did not get the change by having changed the number Mg and Mg2Ni, and It was a mix crystal film with Mg. Moreover, it is thought that the diffusion of the Ni particle by the energy of sputtered p of lamination layer, but Ra and resistivity rose greatly in any film in the substrate temperature of 200℃, so the film is thought to cause re-evaporation of Mg. In all the films, the transmittance at the hydrogenation was less than 1%, and the characteristic of switching mirror was not obtained. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Mg-Ni / Alternate Deposition / Characteristics of Switching mirror / / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 107, no. 178, CPM2007-43, pp. 39-44, Aug. 2007. |
Paper # |
CPM2007-43 |
Date of Issue |
2007-08-02 (CPM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
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CPM2007-43 Link to ES Tech. Rep. Archives: CPM2007-43 |
Conference Information |
Committee |
CPM |
Conference Date |
2007-08-09 - 2007-08-10 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Yamagata Univ. |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Electronic Component Parts and Materials, etc. |
Paper Information |
Registration To |
CPM |
Conference Code |
2007-08-CPM |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Characteristics of Mg-Ni thin films deposited by sputtering method |
Sub Title (in English) |
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Keyword(1) |
Mg-Ni |
Keyword(2) |
Alternate Deposition |
Keyword(3) |
Characteristics of Switching mirror |
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1st Author's Name |
Takashi Aikoh |
1st Author's Affiliation |
Niigata University (Niigata Univ.) |
2nd Author's Name |
Daisaku Nagahama |
2nd Author's Affiliation |
Niigata University (Niigata Univ.) |
3rd Author's Name |
Makoto Hirata |
3rd Author's Affiliation |
Niigata University (Niigata Univ.) |
4th Author's Name |
Hidehiko Shimizu |
4th Author's Affiliation |
Niigata University (Niigata Univ.) |
5th Author's Name |
Takeo Maruyama |
5th Author's Affiliation |
Niigata University (Niigata Univ.) |
6th Author's Name |
Haruo Iwano |
6th Author's Affiliation |
Niigata University (Niigata Univ.) |
7th Author's Name |
Takahiro Kawakami |
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Niigata University (Niigata Univ.) |
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Speaker |
Author-1 |
Date Time |
2007-08-09 16:35:00 |
Presentation Time |
25 minutes |
Registration for |
CPM |
Paper # |
CPM2007-43 |
Volume (vol) |
vol.107 |
Number (no) |
no.178 |
Page |
pp.39-44 |
#Pages |
6 |
Date of Issue |
2007-08-02 (CPM) |
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