Paper Abstract and Keywords |
Presentation |
2006-10-05 15:45
Estimation of AlGaN/GaN HFET surface barrier height with Cat-CVD SiN passivation by XPS and C-V measurements Norio Onojima, Masataka Higashiwaki (NICT), Jun Suda, Tsunenobu Kimoto (Kyoto Univ.), Takashi Mimura (NICT/Fujitsu Lab.), Toshiaki Matsui (NICT) Link to ES Tech. Rep. Archives: ED2006-158 CPM2006-95 LQE2006-62 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
AlGaN surface barrier heights in AlGaN/GaN heterostructure field-effect transistors (HFETs) with and without SiN passivation were estimated in detail by x-ray photoelectron spectroscopy (XPS) and capacitance-voltage (C-V) measurements. SiN passivation was performed by catalytic chemical vapor deposition (Cat-CVD), which has been already found to increase two-dimensional electron gas (2DEG) density. In this contribution, we demonstrate that a reduction of AlGaN surface barrier height is actually induced by Cat-CVD SiN passivation, which is most likely to be a significant factor of increase in the 2DEG density of AlGaN/GaN HFETs. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
AlGaN/GaN heterostructure field-effect transistor (HFET) / SiN passivation / catalytic chemical vapor deposition (Cat-CVD) / surface barrier height / x-ray photoelectron spectroscopy (XPS) / capacitance-voltage (C-V) / / |
Reference Info. |
IEICE Tech. Rep., vol. 106, no. 269, ED2006-158, pp. 35-38, Oct. 2006. |
Paper # |
ED2006-158 |
Date of Issue |
2006-09-28 (ED, CPM, LQE) |
ISSN |
Print edition: ISSN 0913-5685 |
Copyright and reproduction |
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Link to ES Tech. Rep. Archives: ED2006-158 CPM2006-95 LQE2006-62 |
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