IEICE Technical Committee Submission System
Conference Paper's Information
Online Proceedings
[Sign in]
Tech. Rep. Archives
 Go Top Page Go Previous   [Japanese] / [English] 

Paper Abstract and Keywords
Presentation 2006-10-05 15:45
Estimation of AlGaN/GaN HFET surface barrier height with Cat-CVD SiN passivation by XPS and C-V measurements
Norio Onojima, Masataka Higashiwaki (NICT), Jun Suda, Tsunenobu Kimoto (Kyoto Univ.), Takashi Mimura (NICT/Fujitsu Lab.), Toshiaki Matsui (NICT) Link to ES Tech. Rep. Archives: ED2006-158 CPM2006-95 LQE2006-62
Abstract (in Japanese) (See Japanese page) 
(in English) AlGaN surface barrier heights in AlGaN/GaN heterostructure field-effect transistors (HFETs) with and without SiN passivation were estimated in detail by x-ray photoelectron spectroscopy (XPS) and capacitance-voltage (C-V) measurements. SiN passivation was performed by catalytic chemical vapor deposition (Cat-CVD), which has been already found to increase two-dimensional electron gas (2DEG) density. In this contribution, we demonstrate that a reduction of AlGaN surface barrier height is actually induced by Cat-CVD SiN passivation, which is most likely to be a significant factor of increase in the 2DEG density of AlGaN/GaN HFETs.
Keyword (in Japanese) (See Japanese page) 
(in English) AlGaN/GaN heterostructure field-effect transistor (HFET) / SiN passivation / catalytic chemical vapor deposition (Cat-CVD) / surface barrier height / x-ray photoelectron spectroscopy (XPS) / capacitance-voltage (C-V) / /  
Reference Info. IEICE Tech. Rep., vol. 106, no. 269, ED2006-158, pp. 35-38, Oct. 2006.
Paper # ED2006-158 
Date of Issue 2006-09-28 (ED, CPM, LQE) 
ISSN Print edition: ISSN 0913-5685
Copyright
and
reproduction
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF Link to ES Tech. Rep. Archives: ED2006-158 CPM2006-95 LQE2006-62

Conference Information
Committee ED CPM LQE  
Conference Date 2006-10-05 - 2006-10-06 
Place (in Japanese) (See Japanese page) 
Place (in English)  
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To ED 
Conference Code 2006-10-ED-CPM-LQE 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Estimation of AlGaN/GaN HFET surface barrier height with Cat-CVD SiN passivation by XPS and C-V measurements 
Sub Title (in English)  
Keyword(1) AlGaN/GaN heterostructure field-effect transistor (HFET)  
Keyword(2) SiN passivation  
Keyword(3) catalytic chemical vapor deposition (Cat-CVD)  
Keyword(4) surface barrier height  
Keyword(5) x-ray photoelectron spectroscopy (XPS)  
Keyword(6) capacitance-voltage (C-V)  
Keyword(7)  
Keyword(8)  
1st Author's Name Norio Onojima  
1st Author's Affiliation National Institute of Information and Communications Technology (NICT)
2nd Author's Name Masataka Higashiwaki  
2nd Author's Affiliation National Institute of Information and Communications Technology (NICT)
3rd Author's Name Jun Suda  
3rd Author's Affiliation Kyoto University (Kyoto Univ.)
4th Author's Name Tsunenobu Kimoto  
4th Author's Affiliation Kyoto University (Kyoto Univ.)
5th Author's Name Takashi Mimura  
5th Author's Affiliation National Institute of Information and CommuniFujitsu laboratory (NICT/Fujitsu Lab.)
6th Author's Name Toshiaki Matsui  
6th Author's Affiliation National Institute of Information and Communications Technology (NICT)
7th Author's Name  
7th Author's Affiliation ()
8th Author's Name  
8th Author's Affiliation ()
9th Author's Name  
9th Author's Affiliation ()
10th Author's Name  
10th Author's Affiliation ()
11th Author's Name  
11th Author's Affiliation ()
12th Author's Name  
12th Author's Affiliation ()
13th Author's Name  
13th Author's Affiliation ()
14th Author's Name  
14th Author's Affiliation ()
15th Author's Name  
15th Author's Affiliation ()
16th Author's Name  
16th Author's Affiliation ()
17th Author's Name  
17th Author's Affiliation ()
18th Author's Name  
18th Author's Affiliation ()
19th Author's Name  
19th Author's Affiliation ()
20th Author's Name  
20th Author's Affiliation ()
Speaker Author-1 
Date Time 2006-10-05 15:45:00 
Presentation Time 25 minutes 
Registration for ED 
Paper # ED2006-158, CPM2006-95, LQE2006-62 
Volume (vol) vol.106 
Number (no) no.269(ED), no.270(CPM), no.271(LQE) 
Page pp.35-38 
#Pages
Date of Issue 2006-09-28 (ED, CPM, LQE) 


[Return to Top Page]

[Return to IEICE Web Page]


The Institute of Electronics, Information and Communication Engineers (IEICE), Japan