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| Presentation | 2006-02-17 15:40 Fabrication of amorphous Si/SiO2 superlattices by using RF sputtering and their luminescence properties Yuji Kato, Takeshi Tanemura, Hitomi Hoshino, Kenta Miura, Osamu Hanaizumi (Gunma Univ.) Link to ES Tech. Rep. Archives:  OPE2005-152 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | We made a comparative study on luminescent properties of amorphous Si/SiO2 superlattices fabricated by using RF sputtering having various thickness of Si and SiO2 layers. The samples showed a tendency that their photoluminescence (PL) peaks shift to low photon energy for the Si content of the superlattice after annealing at 1100℃. Moreover, we found that they showed ultraviolet PL part at room temperature after annealing 1150℃ to 1250℃. The PL peak position was 3.4 eV and the full width half maximum(FWHM) was 0.20 eV. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | superlattice / red photoluminescence / urtlaviolet photoluminescence / amorphous Si / SiO2 / RF sputtering / / | |
| Reference Info. | IEICE Tech. Rep., vol. 105, no. 606, OPE2005-152, pp. 35-39, Feb. 2006. | |
| Paper # | OPE2005-152 | |
| Date of Issue | 2006-02-10 (OPE) | |
| ISSN | Print edition: ISSN 0913-5685 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | Link to ES Tech. Rep. Archives: OPE2005-152 |
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| Conference Information | |
| Committee | OPE |
| Conference Date | 2006-02-17 - 2006-02-17 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Paper Information | |
| Registration To | OPE |
| Conference Code | 2006-02-OPE |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Fabrication of amorphous Si/SiO2 superlattices by using RF sputtering and their luminescence properties |
| Sub Title (in English) | |
| Keyword(1) | superlattice |
| Keyword(2) | red photoluminescence |
| Keyword(3) | urtlaviolet photoluminescence |
| Keyword(4) | amorphous Si |
| Keyword(5) | SiO2 |
| Keyword(6) | RF sputtering |
| Keyword(7) | |
| Keyword(8) | |
| 1st Author's Name | Yuji Kato |
| 1st Author's Affiliation | Gunma University (Gunma Univ.) |
| 2nd Author's Name | Takeshi Tanemura |
| 2nd Author's Affiliation | Gunma University (Gunma Univ.) |
| 3rd Author's Name | Hitomi Hoshino |
| 3rd Author's Affiliation | Gunma University (Gunma Univ.) |
| 4th Author's Name | Kenta Miura |
| 4th Author's Affiliation | Gunma University (Gunma Univ.) |
| 5th Author's Name | Osamu Hanaizumi |
| 5th Author's Affiliation | Gunma University (Gunma Univ.) |
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| Speaker | Author-1 |
| Date Time | 2006-02-17 15:40:00 |
| Presentation Time | 25 minutes |
| Registration for | OPE |
| Paper # | OPE2005-152 |
| Volume (vol) | vol.105 |
| Number (no) | no.606 |
| Page | pp.35-39 |
| #Pages | 5 |
| Date of Issue | 2006-02-10 (OPE) |
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