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| Presentation | 2005-11-12 09:50 Photocatalytic H2S decomposition by InN1-xOx films grown by ArF laser-assisted MOCVD Masayoshi Miyanishi (Univ. of Fukui), Naoya Takahashi (Fukui NCT), Takahiro Kobayashi (Univ. of Fukui), Katsumi Takayama (Fukui NCT), Yukio Nambo (Nicca), Akihiro Hashimoto, Akio Yamamoto (Univ. of Fukui) Link to ES Tech. Rep. Archives:  CPM2005-163 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | An InN1-xOx, which is an alloy of InN with In2O3, is grown at a low (RT-500ºC) temperature by the ArF excimer laser-assisted MOCVD (La-MOCVD) using TMI and NH3. Photocatalytic activity of InN1-xOx film is experimentally studied for the first time. Decomposition rate of H2S is evaluated as a photocatalytic activity of InN1-xOx film. We have found that films grown at a temperature in the range RT-200ºC have an excellent photocatalytic activity, which is better than those for the conventional In2O3 and TiO2. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | InN1-xOx / MOCVD / NH3 / photolysis / ArF excimer laser / H2S / photocatalyst / | |
| Reference Info. | IEICE Tech. Rep., vol. 105, no. 394, CPM2005-163, pp. 9-12, Nov. 2005. | |
| Paper # | CPM2005-163 | |
| Date of Issue | 2005-11-05 (CPM) | |
| ISSN | Print edition: ISSN 0913-5685 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | Link to ES Tech. Rep. Archives: CPM2005-163 |
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| Conference Information | |
| Committee | CPM |
| Conference Date | 2005-11-11 - 2005-11-12 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Paper Information | |
| Registration To | CPM |
| Conference Code | 2005-11-CPM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Photocatalytic H2S decomposition by InN1-xOx films grown by ArF laser-assisted MOCVD |
| Sub Title (in English) | |
| Keyword(1) | InN1-xOx |
| Keyword(2) | MOCVD |
| Keyword(3) | NH3 |
| Keyword(4) | photolysis |
| Keyword(5) | ArF excimer laser |
| Keyword(6) | H2S |
| Keyword(7) | photocatalyst |
| Keyword(8) | |
| 1st Author's Name | Masayoshi Miyanishi |
| 1st Author's Affiliation | University of Fukui (Univ. of Fukui) |
| 2nd Author's Name | Naoya Takahashi |
| 2nd Author's Affiliation | Fukui National College of Technology (Fukui NCT) |
| 3rd Author's Name | Takahiro Kobayashi |
| 3rd Author's Affiliation | University of Fukui (Univ. of Fukui) |
| 4th Author's Name | Katsumi Takayama |
| 4th Author's Affiliation | Fukui National College of Technology (Fukui NCT) |
| 5th Author's Name | Yukio Nambo |
| 5th Author's Affiliation | Nicca Chemical Corporation (Nicca) |
| 6th Author's Name | Akihiro Hashimoto |
| 6th Author's Affiliation | University of Fukui (Univ. of Fukui) |
| 7th Author's Name | Akio Yamamoto |
| 7th Author's Affiliation | University of Fukui (Univ. of Fukui) |
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| Speaker | Author-1 |
| Date Time | 2005-11-12 09:50:00 |
| Presentation Time | 25 minutes |
| Registration for | CPM |
| Paper # | CPM2005-163 |
| Volume (vol) | vol.105 |
| Number (no) | no.394 |
| Page | pp.9-12 |
| #Pages | 4 |
| Date of Issue | 2005-11-05 (CPM) |
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