Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380
[TOP] | [2015] | [2016] | [2017] | [2018] | [2019] | [2020] | [2021] | [Japanese] / [English]
CPM2018-8
Effects of nitrogen doping on the properties of Si-doped DLC films
Kazuki Nakamura, Haruka Oohashi (Hirosaki Univ.), Tai Yokoyama, Kei-ichiro Tajima, Norihumi Endo, Maki Suemitsu (Tohoku Univ.), Yoshiharu Enta, Yasuyuki Kobayashi, Yushi Suzuki, Hideki Nakazawa (Hirosaki Univ.)
pp. 1 - 6
CPM2018-9
Growth of graphene on SiC/AlN/Si(110) substrates
Hideki Nakazawa, Syunki Narita, Yuki Nara, Yoshiharu Enta (Hirosaki Univ.)
pp. 7 - 12
CPM2018-10
Investigation of formation conditions of SiC buffer layers for SiC/SiC buffer layer/AlN/Si(110) multilayer structures
Yuki Nara, Asahi Kudo, Hideki Nakazawa (Hirosaki Univ.)
pp. 13 - 16
CPM2018-11
Developement of production-scale atomic layer deposition and its application for anticorrosion coating
Fumihiko Hirose (Yamagata)
pp. 17 - 20
CPM2018-12
Study on the formation mechanism of Bi-mediated Ge nanodots fabricated by vacuum evaporation
Kazuto Tsushima, Kensuke Takita, Hideki Nakazawa (Hirosaki Univ.), Takehiko Tawara, Kouta Tateno, Guoqiang Zhang, Hideki Gotoh (NTT), Takayuki Ikeda, Seiichiro Mizuno (NTT-AT), Hiroshi Okamoto (Hirosaki Univ.)
pp. 21 - 24
CPM2018-13
Fabrication and properties of multiferroic composites for optical modulation
Yuichi Nakamura, Naohide Kamada, Taichi Goto, Hironaga Uchida, Mitsuteru Inoue (Toyohashi Tech.)
pp. 25 - 28
CPM2018-14
Nitrogen doping to ZnO films using NO gas excited on heated Ir wire surface in a catalytic reaction-assisted chemical vapor deposition
Yuuki Adachi, Ryuta Iba, Shotarou Ono (Nagaoka Univ. Technol.), Koichirou Ooishi, Hironori Katagiri (Nagaoka College), Kanji Yasui (Nagaoka Univ. Technol.)
pp. 29 - 32
CPM2018-15
Relationship between taste evaluation of Ezoshika meat and electrical measurement
Mayumi B. Takeyama (Kitami Inst. & Technol.), Shinji Yokogawa (UEC), Masaru Sato, Takashi Yasui (Kitami Inst. & Technol.)
pp. 33 - 38
CPM2018-16
Characterization of ZrOxNy thin films deposited at low temperatures
Masaru Sato, Hideki Kitada, Mayumi B. Takeyama (kitami inst. of tech.)
pp. 39 - 42
CPM2018-17
Evaluation of rear surface passivation layer deposited by wet process
Ryosuke Watanabe (Hirosaki Univ.), Tsubasa Koyama, Yoji Saito (Seikei Univ.)
pp. 43 - 46
CPM2018-18
Reduction reaction of SiO2 layer on Si substrate by irradiation of electron beam
Keisuke Fujimori, Yosuke Chida, Yusuke Masuda, Natsuki Ujiie, Yoshiharu Enta (Hirosaki Univ.)
pp. 47 - 52
CPM2018-19
Surface composition and chemical bond structure of Zr-based metallic glass
Haruto Koriyama, Keisuke Fujimori, Yoshiharu Enta (Hirosaki Univ.), Nozomu Togashi (Adamant Namiki Precision Jewel)
pp. 53 - 56
Note: Each article is a technical report without peer review, and its polished version will be published elsewhere.