Date | Thema | Place | Monthly Secretary | Co-organization | Deadline |
April/19-20 | Low-Temp Poly-Si, TFT and Organic EL Technology | Kyushu Institute of Tech.
(Iizuka-shi, Fukuoka-ken) |
T.Noguchi(T.Asano, K.Kurogi) | ED | Finished |
May/24-25 | Semiconductor Materials and Evaluation Techniques, and Applied Devices(Compound Semi., Si, Electric Materials, Solar Cell, High-voltage High-power Devices) | Hamamatsu campus
Shizuoka University(Hamamatsu-shi) |
M.Tabe(A.Wakahara, Y.Sato) | ED, CPM |
|
June | Gate Dielectrics, Capacitor Films, Functional Films and Memory Technology | Astelu Plaza (Hiroshima-shi) | S.Miyazaki(T.Nishioka, N.Haneji) | Finished | |
July/5-7 | 2001 Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices (AWAD) | KAL Hotel, Seogwipo, Cheju-Do, Korea | N.Matsuo(Yamaguchi Univ.) | IEEK, ED |
|
Aug/2-3 | Circuit and Device Technologies for VLSI and other Technologies | Muroran Institute of Tech.
(Muroran, Hokkaido) |
T.Matsuda(T.Hiramoto、S.Watanabe) | ICD | May/21 |
September | Process, Device and Circuit Modeling and Simulation | Not Decided | S.Matsumoto (Kamakura) | VLD | July |
October | Ultra-clean Technology and New Process Technology | Tohoku University
(Sendai) |
K.Kotani(Ohno) | August | |
Novenber | Low-k Dielectrics and Interconnection Technology | Not Decided | N.Matsuo (Y.Inoue, H.Komiya) | September | |
Decenber | Fabrication and Evaluation for Si-related Materials | Nara Institute of Sci. and Tech. | T.Fuyuki(I.Matsuo(Matsushita)、T.Kimoto) | October | |
January, 2002 | Advanced CMOS Devices and Related Process Technologies. | Not Decided | H.Takemura (S.Sugii, Y.Takahashi) | Novenber | |
February,2002 | Quantum Devices and Related Technologies | Hokkaido University
(Sapporo) |
M.Akazawa (M.Tabe, T.Hiramoto) | ED | Decenber |
March, 2002 | Ferro-electric Films and those Applications | Tokyo | M.Hiratani(E.Tokumitsu, M.Ohno) | January, 2002 |
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