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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
COMP |
2014-04-24 10:20 |
Miyagi |
Tohoku University |
Thin strip graphs Yota Otachi (JAIST), Akitoshi Kawamura (Univ. of Tokyo), Hidehiro Shinohara (Tohoku Univ.), Takashi Hayashi, Koichi Yamazaki (Gunma Univ.) COMP2014-1 |
A unit disk graph is a emph{$c$-strip graph} if it has a unit disk representation in which all centers of the unit disks... [more] |
COMP2014-1 pp.1-4 |
COMP |
2012-10-31 14:40 |
Miyagi |
Tohoku University |
On 1 + $\epsilon$ strip graphs Takashi Hayashi (Gunma Univ.), Hidehiro Shinohara (Tohoku Univ.), Koichi Yamazaki (Gunma Univ.) COMP2012-39 |
A unit disk graph $G$ is called an $\varepsilon$-strip graph,
if all center points of the disks lie
in a parallel stri... [more] |
COMP2012-39 pp.33-36 |
NS, RCS (Joint) |
2010-12-17 13:20 |
Okayama |
Okayama Univ. |
Transmit Diversity based on Nested Turbo Code Takashi Hayashi, Koji Ishii (Kagawa Univ.), Kozue Hirata, Shimpei Toh, Minoru Kubota (Sharp) RCS2010-190 |
A nested code has the nature of network coding as well as error correcting coding.
A nested encoder consists of several... [more] |
RCS2010-190 pp.185-190 |
RCS, SAT (Joint) |
2009-12-17 09:40 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
A Novel Transmit Diversity Technique with Nested Code Koji Ishii, Takashi Hayashi (Kagawa Univ.), Kozue Hirata, Shimpei Toh, Minoru Kubota (Sharp Corp.) RCS2009-169 |
We propose a novel transmit diversity technique with a nested code. In general, to achieve diversity gain, the system ne... [more] |
RCS2009-169 pp.13-18 |
RCS, SAT (Joint) |
2009-12-17 10:00 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Performance Evaluation of Transmit Diversity with Nested Code Takashi Hayashi, Koji Ishii, Shigeaki Ogose (Kagawa Univ.), Kozue Hirata, Shimpei Toh, Minoru Kubota (SHARP Corp.) RCS2009-170 |
In this paper, we construct the transmit diversity technique with a nested coding technique and evaluate its performance... [more] |
RCS2009-170 pp.19-24 |
SDM, VLD |
2007-10-30 15:00 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Impact of Shear Strain and Quantum Confinement on <110> Channel nMOSFET with High-Stress CESL Hiroyuki Takashino, Takeshi Okagaki, Tetsuya Uchida, Takashi Hayashi, Motoaki Tanizawa, Eiji Tsukuda, Katsumi Eikyu, Shoji Wakahara, Kiyoshi Ishikawa, Osamu Tsuchiya, Yasuo Inoue (Renesas Technology Corp.) VLD2007-57 SDM2007-201 |
Numerical study in conjunction with comprehensive bending
experiments has demonstrated that \orientation{100}-Si has th... [more] |
VLD2007-57 SDM2007-201 pp.33-36 |
SDM, VLD |
2007-10-30 15:50 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Validation of the Effect of Full Stress Tensor in HoleTransport in Strained 65nm-node pMOSFETs Eiji Tsukuda (Renesas), Yoshinari Kamakura (Osaka Univ.), Hiroyuki Takashino, Takeshi Okagaki, Tetsuya Uchida, Takashi Hayashi, Motoaki Tanizawa, Katsumi Eikyu, Shoji Wakahara, Kiyoshi Ishikawa, Osamu Tsuchiya, Yasuo Inoue (Renesas), Kenji Taniguchi (Osaka Univ.) VLD2007-59 SDM2007-203 |
We have developed a system consisting of a full-3D process simulator for stress calculation and k·pband calculation... [more] |
VLD2007-59 SDM2007-203 pp.43-46 |
SDM |
2006-06-21 15:20 |
Hiroshima |
Faculty Club, Hiroshima Univ. |
Work-function engineering of poly-Si gate by Fermi level pinning and its impact on low power CMOSFET Yasuhiro Shimamoto (Hitachi), Jiro Yugami, Masao Inoue, Masaharu Mizutani, Takashi Hayashi, Masahiro Yoneda (Renesas) |
[more] |
SDM2006-47 pp.31-35 |
ICD, SDM |
2005-08-19 11:35 |
Hokkaido |
HAKODATE KOKUSAI HOTEL |
Gate work-function modulation in SiON/poly-Si gate stacks, and its impact on low power devices
-- Advantage of sub-monolayer Hf at SiON/poly-Si interface -- Jiro Yugami (Renesas), Yasuhiro Shimamoto (Hitachi), Masao Inoue, Masaharu Mizutani, Takashi Hayashi, Katsuya Shiga, Fumiko Fujita, Jyunichi Tuchimoto, Yoshikazu Ohno, Masahiro Yoneda (Renesas) |
Gate work-function (WF) is controlled by incorporating sub-monolayer Hf at SiON/poly-Si interface. This technique provid... [more] |
SDM2005-149 ICD2005-88 pp.37-42 |
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