Silicon photonics has been expected as a key technology which is enable to integrate functionalities in a single chip for optical transceivers. In order to assure the reproducibility of optical circuit performance, it is a critical to reduce the variation of effective refractive index in various waveguide devices due to fabrication processes. In this study, by using an automatic wafer-level optical probing system, the experimental results of performance variations in passive devices of wire-waveguides, microring resonators, and grating couplers, which were fabricated by using highly-uniform 300-mm SOI wafers and high-resolution ArF immersion lithography. On the basis of the results, we discuss the effects of fabrication variation on device reproducibility.