Paper Abstract and Keywords |
Presentation |
2016-11-28 15:30
Circuit Simulation Method Using Bimodal Defect-Centric Model of Random Telegraph Noise on 40 nm SiON Process Michitarou Yabuuchi, Azusa Oshima, Takuya Komawaki, Kazutoshi Kobayashi, Ryo Kishida, Jun Furuta (KIT), Pieter Weckx (KUL/IMEC), Ben Kaczer (IMEC), Takashi Matsumoto (Univ. of Tokyo), Hidetoshi Onodera (Kyoto Univ.) VLD2016-52 DC2016-46 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
We propose a circuit analysis method using the bimodal RTN (random telegraph
noise) model of the defect-centric distribution. The conventional unimodal
model fails to replicate the effect of RTN on 40 nm SiON process
circuits. The bimodal model takes into account
defect characteristics of both HK and interface layer in
gate dielectric. The proposed method estimates defect
characteristics and reproduces frequency distributions by
RTN. We confirm the bimodal model fully
replicates the effect of RTN by comparing simulation and
measurement results of 40 nm test chips. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
RTN (Random Telegraph Noise) / defect-centric distribution / variation / reliability / circuit design / / / |
Reference Info. |
IEICE Tech. Rep., vol. 116, no. 330, VLD2016-52, pp. 49-54, Nov. 2016. |
Paper # |
VLD2016-52 |
Date of Issue |
2016-11-21 (VLD, DC) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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VLD2016-52 DC2016-46 |