Paper Abstract and Keywords |
Presentation |
2016-03-02 10:55
Lithography Hotspot Detection Using Histogram of Oriented Light Propagation Yoichi Tomioka (UoA), Tetsuaki Matsunawa (Toshiba) VLD2015-136 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
In recent semiconductor manufacturing process, it is essential to detect and to remove lithography hotspots, which induce printability issues. The machine learning based hotspot detection has recently been received attractive attentions. It is important to use appropriate features to capture essential characteristics of hotspots to precisely detect unknown hotspots that are not used in training. In this paper, we propose a novel layout feature based on the propagation of light passing through a photomask. Moreover, we report methods to construct a reliable hotspot detector that can reduce false alarms which are similar to hotspots. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Design for manufacturability / Lithography / Hotspot / Intensity gradient / Real AdaBoost / / / |
Reference Info. |
IEICE Tech. Rep., vol. 115, no. 465, VLD2015-136, pp. 143-148, Feb. 2016. |
Paper # |
VLD2015-136 |
Date of Issue |
2016-02-22 (VLD) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
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VLD2015-136 |
Conference Information |
Committee |
VLD |
Conference Date |
2016-02-29 - 2016-03-02 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Okinawa Seinen Kaikan |
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(See Japanese page) |
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Paper Information |
Registration To |
VLD |
Conference Code |
2016-02-VLD |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Lithography Hotspot Detection Using Histogram of Oriented Light Propagation |
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Design for manufacturability |
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Lithography |
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Hotspot |
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Intensity gradient |
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Real AdaBoost |
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1st Author's Name |
Yoichi Tomioka |
1st Author's Affiliation |
University of Aizu (UoA) |
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Tetsuaki Matsunawa |
2nd Author's Affiliation |
Toshiba Corporation (Toshiba) |
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Speaker |
Author-1 |
Date Time |
2016-03-02 10:55:00 |
Presentation Time |
25 minutes |
Registration for |
VLD |
Paper # |
VLD2015-136 |
Volume (vol) |
vol.115 |
Number (no) |
no.465 |
Page |
pp.143-148 |
#Pages |
6 |
Date of Issue |
2016-02-22 (VLD) |
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