第２回最新のMEMS技術を利用した圧電デバイスに関する国際ワークショップ
2nd international workshop on piezo-devices based on latest MEMS technologies
主催 周波数制御・選択に係るMEMSデバイスの評価方法に関する標準化委員会（委員長 大和田邦樹）
Sponsored
by Standardization Committee for MEMS Devices for Frequency Control and Selection
(Chair K.Ohwada)
協賛 電子情報通信学会 周波数制御・選択デバイス専門委員会 （委員長 関根好文）
IEEE Ultrasonics, Ferroelectrics and Frequency Control Society Japan Chapter （委員長 門田道雄）
マイクロマシンセンター
In collaboration with Japanese national committee of TC49 in IEICE (Chair Y.Sekine)
IEEE Ultrasonics, Ferroelectrics and Frequency Control Society Japan Chapter (Chair M.Kadota)
Micromachine
Center
日時：平成20年9月8日（月）～ 平成20年9月9日（火）(September 8th
(Mon) and 9th (Tue), 2008)
会場：機械振興会館 66号室,67号室 (Room 66&67, Promotion of Machine Industry Building)
交通：JR山の手・京浜東北線「浜松町」駅 下車徒歩15分 (15min. Walk from JR Hamamatsu-cho Station)
東京メトロ日比谷線「神谷町」駅 下車徒歩8分
(8min. walk from Tokyo-Metro Hibiya-line Kamiya-cho Station)
都営地下鉄三田線「御成門」駅 下車徒歩8分
(8min. walk from Toei-Subway Onari-Mon Station)
都営地下鉄大江戸線「赤羽橋」駅 下車徒歩10分
(10min. walk from Toei-Subway Akabane-Bashi Station)
都営地下鉄浅草線・大江戸線「大門」駅 下車徒歩10分
(10min. walk from Toei-Subway Daimon Station)
所在地 〒105-0011 東京都港区芝公園3-5-8
3-5-8 Shiba-Koen, Minato-ku, Tokyo 105-0011, Japan
URL: http://www.jcmanet.or.jp/gaiyo/map_kaikan.htm
September
8th (Mon), 2008
1 |
Opening Address
K.Ohwada, Teikyo
University
|
9:40
|
2 |
International Standardization Activities in Japan |
9:50
|
A.Izumi, Standardization Office for Information Technology and Electrotechnology, METI |
3 |
Process Technology for Monolithic Integration of RF MEMS
and Advanced LSI
|
10:20 |
S.Tanaka and M.Esashi, Tohoku University |
4 |
BAW and SAW: Competing or Complementing
Technologies?
|
11:05 |
K.Wagner, A.Link and S.Marksteiner, EPCOS AG, Germany |
|
Lunch Break (11:50-13:05) |
|
5 |
Temperature
Stable FBAR Resonator/Oscillator for SONET/SDH, SATA, and WiMAX
Fixed Frequency Applications
|
13:05 |
R.Ruby, W.Pang, R.Parker, L.Callighan and M.Unkrich, Avago Technologies, USA |
6 |
Non-Linearity
Modelling of BAW Resonators
|
13:50 |
|
J.-W.Lobeek, R.Strijbos, M.Rolsma, A.Simin and H. Breur,
NXP
Semiconductors, the Netherlands
|
7 |
Nonlinear behavior in
RF-BAW devices: Characterization, Modeling and Impact on Filter Design
|
14:35 |
R. Aigner and G. Fattinger, TriQuint Semiconductor, USA |
|
Intermission (15:20-15:30)
|
|
8 |
Considerations on Non-Linearities in BAW
Resonators
|
15:30 |
M.Handtmann, K.Mutamba, B.Gebauer and M.Franosch, Infineon Technologies AG, Germany |
9 |
IonScan 800 -- Ultra-Precise
Film Thickness Trimming for Semiconductor Industry
|
16:15 |
M.Zeuner, M.Nestler, M.Demmler and F.Allenstein, Roth & Rau |
Social Gathering (17:30-20:00)
September 9th (Tue), 2008
1 |
A Study on Suitable circuit structure for Piezoelectric MEMS Oscillators |
9:10 |
T.Adachi, Yohohama National University |
2 |
Improvement
Method of Phase Noise for Extremely Low Phase Noise SAW Oscillator
|
9:40
|
|
T.Imaike, Y.Sakuta and Y.Sekine,
Nihon University
|
3 |
Ultra-Low Clock Jitter Measurement with Femto-Second Resolution Through Phase Noise Measurement Technique |
10:10 |
A.Oginuma, Agilent Technologies International Japan, Ltd. |
|
Intermission (10:40-10:50) |
|
4 |
Experimental Study of Low Power 85Rb CPT Atomic Clock |
10:50
|
|
S.Goka, Tokyo Metropolitan University
|
5 |
High-Frequency-Fundamental
Quartz Resonator
|
11:20 |
R.Yasuike, Seiko Epson, Co.Ltd |
6 |
Aluminum Nitride Lamb Wave Resonator Using Germanium
Sacrificial Layer
|
11:50 |
K.Hirano, M.Esashi* and S.Tanaka*, Nihon Dempa Kogyo Co. Ltd, *Tohoku University |
|
Lunch Break (12:20-13:20) |
|
7 |
Balanced Duplexer using BAW/SAW/IPD Technologies |
13:20 |
|
T.Nishihara, M.Iwaki,
G.Endo*, X.Mi, S.Taniguchi, M.Ueda and YSatoh
FUJITSU LABORATORIES LTD., *FUJITSU MEDIA DEVICES LIMITED
|
8 |
High-Frequency Lamb Wave
Device composed of LiNbO3 Thin Film
|
13:50 |
|
M.Kadota, T.Ogami, K.Yamamoto, Y.Negoro and H.Tochishita, Murata MFG,
Co. Ltd.
|
9 |
High Frequency SAW filter based on Diamond Thin Film |
14:20 |
S.Fujii, K.Kawano, T.Umeda, M.Fujioka, and M.Yoda, Seiko Epson, Co. Ltd. |
|
Intermission (14:50-15:00) |
|
10 |
Design of Narrower Bandwidth Ladder-type Filters with Sharp Transition Bands Using Mutually Connected Resonator Elements |
15:00 |
T.Komatsu, Y.Tanaka, K.Hashimoto, T.Omori and M.Yamaguchi, Chiba University |
11 |
Study of Frequency Dependent Lateral Leakage in RF BAW Device by Laser Probe System |
15:30 |
|
N.Wu, K.Hashimoto, K.Kashiwa, T.Omori and M.Yamaguchi, Chiba University
|
12 |
Improvement of Laser-Speckle Mode Shape Visualization System Based on Inverse Transformation of 2D-Correlation Function |
16:00 |
Y.Watanabe, K.Tachibana, S.Goka, T.Sato and H.Sekimoto, Tokyo Metropolitan University |
13 |
Closing Address |
16:30 |
K.Hashimoto, Chiba University |
【ワークショップの定員】 100名 （先着順，定員になり次第締め切りとさせて頂きます） 事前登録制
【参加申込締切日】 平成20年8月31日（日）
【会費】 ワークショップ参加費 無料、懇親会会費： 5,000円
Registration Fee:
Free, Banquet Fee: 5,000 yen
【申し込み方法】氏名，所属，役職，TEL，E-mailを記載し，下記に送付下さい。(書式は下記のURLからダウンロードしてください)
【申し込み先】 折原（日本電波工業㈱） E-mail: oriharay@ndk.com またはFAX:03-5453-6728にて申込みください。 TEL 03-5453-6780
幹事 橋本研也（千葉大学），折原康子（日本電波工業）
問い合わせ先 折原康子（日本電波工業），E-mail oriharay@ndk.com TEL 03-5453-6780
Advance
Registration is Necessary. Please contact to Workshop Secretary for the advance
registration.
Workshop Secretary: K. Hashimoto (Chiba University) and Y. Orihara (NDK)
Contact Person: Ms Y. Orihara (NDK) through E-mail: oriharay@ndk.com or TEL: +81-3-5453-6780
TC49 Home Page: http://www.ieice.org/jpn/kikaku/tc49/index.html